Electrical Properties of LaLuO3/Si(100) Structures Prepared by Molecular Beam Deposition

2019 ◽  
Vol 33 (3) ◽  
pp. 221-227
Author(s):  
Yuri Y. Gomeniuk ◽  
Yuri V. Gomeniuk ◽  
Alexei N. Nazarov ◽  
Paul K. Hurley ◽  
Karim Cherkaoui ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Molecular Beam ◽  
Molecular Beam Deposition ◽  
Beam Deposition

Structure and electrical properties of polycrystalline SiGe films grown by molecular beam deposition

2007 ◽  
Vol 41 (3) ◽  
pp. 341-344 ◽  
Author(s):  
I. B. Chistokhin ◽  
A. K. Gutakovskiĭ ◽  
A. S. Deryabin
Keyword(s):  
Electrical Properties ◽  
Molecular Beam ◽  
Molecular Beam Deposition ◽  
Beam Deposition

LaAlO3/Si capacitors: Comparison of different molecular beam deposition conditions and their impact on electrical properties

2013 ◽  
Vol 113 (3) ◽  
pp. 034106 ◽  
Author(s):  
Sylvain Pelloquin ◽  
Guillaume Saint-Girons ◽  
Nicolas Baboux ◽  
David Albertini ◽  
Waël Hourani ◽  
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Electrical Properties ◽  
Molecular Beam ◽  
Molecular Beam Deposition ◽  
Beam Deposition ◽  
Deposition Conditions

Molecular beam deposition of high quality silicon oxide dielectric films

1995 ◽  
Vol 148 (4) ◽  
pp. 336-344 ◽  
Author(s):  
Naresh Chand ◽  
J.E. Johnson ◽  
J.W. Osenbach ◽  
W.C. Liang ◽  
L.C. Feldman ◽  
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Keyword(s):  
Molecular Beam ◽  
Silicon Oxide ◽  
Dielectric Films ◽  
High Quality ◽  
Molecular Beam Deposition ◽  
Beam Deposition
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