LaAlO3/Si capacitors: Comparison of different molecular beam deposition conditions and their impact on electrical properties

2013 ◽  
Vol 113 (3) ◽  
pp. 034106 ◽  
Author(s):  
Sylvain Pelloquin ◽  
Guillaume Saint-Girons ◽  
Nicolas Baboux ◽  
David Albertini ◽  
Waël Hourani ◽  
...  
1994 ◽  
Vol 359 ◽  
Author(s):  
Kiyoshi Yase ◽  
Takuya Saraya ◽  
Kazuhiro Kudo

ABSTRACTFullerene C60 thin solid films have been fabricated on the (001) surfaces of alkali halides (NaCl, KCI and KBr) and muscovite by organic molecular beam deposition (OMBD) technique. Pure C60 powder was sublimated from the precisely temperature-controlled K-cell at low pressure (10−7 Torr) and deposited onto the substrates kept in the range 125 –300 °C. Increasing both the temperature of K-cell and the substrate temperature, fine crystals grow with different size, shape and distance between neighbors. The dependence of the size and density of island crystals on the deposition conditions revealed the mechanism of crystal growth and the effect of interaction between molecules and substrate surface.


2007 ◽  
Vol 41 (3) ◽  
pp. 341-344 ◽  
Author(s):  
I. B. Chistokhin ◽  
A. K. Gutakovskiĭ ◽  
A. S. Deryabin

2019 ◽  
Vol 33 (3) ◽  
pp. 221-227
Author(s):  
Yuri Y. Gomeniuk ◽  
Yuri V. Gomeniuk ◽  
Alexei N. Nazarov ◽  
Paul K. Hurley ◽  
Karim Cherkaoui ◽  
...  

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