(Invited) The Role of Oxygen in the Development of Hf-Base High-k/Metal Gate Stacks for CMOS Technologies

2019 ◽  
Vol 33 (3) ◽  
pp. 83-94 ◽  
Author(s):  
Eduard A. Cartier
Keyword(s):  
Gate Stacks ◽  
Metal Gate ◽  
High K

Materials Interaction at the Nanoscale in High-k Metal Gate Stacks: The Role of Oxygen

2019 ◽  
Vol 1 (5) ◽  
pp. 363-370 ◽  
Author(s):  
Supratik Guha ◽  
Edward Preisler ◽  
Nestor Bojarczuk ◽  
Matthew Copel
Keyword(s):  
Gate Stacks ◽  
Metal Gate ◽  
High K

The Role of the Interfaces in the 1/f Noise of MOSFETs with High-k Gate Stacks

2019 ◽  
Vol 19 (2) ◽  
pp. 87-99 ◽  
Author(s):  
Felice Crupi ◽  
Paolo Magnone ◽  
Eddy Simoen ◽  
Luigi Pantisano ◽  
Gino Giusi ◽  
...  
Keyword(s):  
Gate Stacks ◽  
High K

Enhanced degradation of n-MOSFETs with high-k/metal gate stacks under channel hot-carrier/gate-induced drain leakage alternating stress

2012 ◽  
Vol 52 (9-10) ◽  
pp. 1901-1904 ◽  
Author(s):  
Dongwoo Kim ◽  
Seonhaeng Lee ◽  
Cheolgyu Kim ◽  
Chiho Lee ◽  
Jeongsoo Park ◽  
...  
Keyword(s):  
Gate Stacks ◽  
Metal Gate ◽  
Hot Carrier ◽  
High K ◽  
Enhanced Degradation

Bottom-up method for work function tuning in high-k/metal gate stacks in advanced CMOS technologies

2011 ◽  
Author(s):  
Mrunal A. Khaderbad ◽  
Rohit Pandharipande ◽  
Aradhana Gautam ◽  
Abhishek Mishra ◽  
Meenakshi Bhaisare ◽  
...  
Keyword(s):  
Work Function ◽  
Gate Stacks ◽  
Metal Gate ◽  
Bottom Up ◽  
High K ◽  
Work Function Tuning

Interplay between Dry Etch and Wet Clean in Patterning La2O3/HfO2 Containing High-k/metal Gate Stacks

2019 ◽  
Vol 25 (5) ◽  
pp. 29-36
Author(s):  
Ingrid Vos ◽  
David Hellin ◽  
Christa Vrancken ◽  
Jef Geypen ◽  
Hugo Bender ◽  
...  
Keyword(s):  
Gate Stacks ◽  
Metal Gate ◽  
High K ◽  
Dry Etch
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