Oxygen Plasma Treated Aluminum as a Gate Dielectric for AlGaN/GaN High Electron Mobility Transistors

2009 ◽  
Vol 156 (9) ◽  
pp. H690 ◽  
Author(s):  
S. Lawrence Selvaraj ◽  
Takashi Egawa
2015 ◽  
Vol 8 (11) ◽  
pp. 111001 ◽  
Author(s):  
Joel T. Asubar ◽  
Yoshiki Sakaida ◽  
Satoshi Yoshida ◽  
Zenji Yatabe ◽  
Hirokuni Tokuda ◽  
...  

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