Oxygen Plasma Treated Aluminum as a Gate Dielectric for AlGaN/GaN High Electron Mobility Transistors
2009 ◽
Vol 156
(9)
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pp. H690
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2012 ◽
Vol 33
(7)
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pp. 997-999
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2012 ◽
Vol 28
(2)
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pp. 029501
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2003 ◽
Vol 47
(10)
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pp. 1781-1786
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2011 ◽
Vol 29
(3)
◽
pp. 031204
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2011 ◽
Vol 50
(4)
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pp. 04DF03
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