Low-temperature-atomic-layer-deposition of SiO2 with Tris(dimethylamino)Silane (TDMAS) and Ozone using Temperature Controlled Water Vapor Treatment

2019 ◽  
Vol 19 (2) ◽  
pp. 417-426 ◽  
Author(s):  
Fumihiko Hirose ◽  
Yuta Kinoshita ◽  
Suguru Shibuya ◽  
Yuzuru Narita ◽  
Hironobu Miya ◽  
...  
Keyword(s):  
Water Vapor ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Temperature Controlled ◽  
Vapor Treatment

Atomic layer deposition of SiO2 from Tris(dimethylamino)silane and ozone by using temperature-controlled water vapor treatment

2010 ◽  
Vol 519 (1) ◽  
pp. 270-275 ◽  
Author(s):  
F. Hirose ◽  
Y. Kinoshita ◽  
S. Shibuya ◽  
Y. Narita ◽  
Y. Takahashi ◽  
...  
Keyword(s):  
Water Vapor ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Temperature Controlled ◽  
Vapor Treatment

Improved electrical properties of Pt/HfO2/Ge using in situ water vapor treatment and atomic layer deposition

2011 ◽  
Vol 98 (10) ◽  
pp. 102905 ◽  
Author(s):  
In-Sung Park ◽  
Youngjae Choi ◽  
William T. Nichols ◽  
Jinho Ahn
Keyword(s):  
Water Vapor ◽  
Electrical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Vapor Treatment

scholarly journals Low temperature temporal and spatial atomic layer deposition of TiO2 films

2015 ◽  
Vol 33 (4) ◽  
pp. 041512 ◽  
Author(s):  
Morteza Aghaee ◽  
Philipp S. Maydannik ◽  
Petri Johansson ◽  
Jurkka Kuusipalo ◽  
Mariadriana Creatore ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tio2 Films ◽  
Layer Deposition ◽  
Temporal And Spatial

Low Temperature Epitaxial Oxide Ultrathin Films and Nanostructures by Atomic Layer Deposition

2012 ◽  
Vol 24 (19) ◽  
pp. 3732-3737 ◽  
Author(s):  
Mariona Coll ◽  
Jaume Gazquez ◽  
Anna Palau ◽  
Maria Varela ◽  
Xavier Obradors ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Ultrathin Films ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Epitaxial Oxide

Hysteresis-free HfO2 film grown by atomic layer deposition at low temperature

2011 ◽  
Vol 519 (22) ◽  
pp. 7723-7726 ◽  
Author(s):  
J. Shen ◽  
C.Y. Zhang ◽  
T.T. Xu ◽  
A.N. Jiang ◽  
Z.Y. Zhang ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Hfo2 Film ◽  
Layer Deposition
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