Characteristic Variations Induced by Random Fluctuation of Source/Drain Lateral Distribution Dopant in Nano-Scale UTB SOI MOSFET

2019 ◽  
Vol 18 (1) ◽  
pp. 77-81
Author(s):  
Linfeng Du ◽  
Hui Deng ◽  
Gang Du ◽  
Ruqi Han ◽  
Shengdong Zhang
Keyword(s):  
Lateral Distribution ◽  
Random Fluctuation ◽  
Soi Mosfet ◽  
Nano Scale ◽  
Utb Soi Mosfet

Nano Scale Soi Mosfet Structures and Study of Performance Factors

2010 ◽  
Vol 1 (28) ◽  
pp. 42-47
Author(s):  
Prakash Baviskar ◽  
Sanjeev Jain ◽  
Prasad Vinchurkar
Keyword(s):  
Soi Mosfet ◽  
Performance Factors ◽  
Nano Scale

scholarly journals The impact of high-k dielectrics on the performance of Schottky barrier source/drain (SBSD) ultra-thin body (UTB) SOI MOSFET

2008 ◽  
Vol 57 (7) ◽  
pp. 4476
Author(s):  
Luan Su-Zhen ◽  
Liu Hong-Xia ◽  
Jia Ren-Xu ◽  
Cai Nai-Qiong ◽  
Wang Jin
Keyword(s):  
Schottky Barrier ◽  
Thin Body ◽  
Soi Mosfet ◽  
High K ◽  
Utb Soi Mosfet ◽  
The Impact
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