ZnSe Nanowire Photodetector Prepared on Oxidized Silicon Substrate by Molecular-Beam Epitaxy

2009 ◽  
Vol 156 (4) ◽  
pp. J73 ◽  
Author(s):  
C. H. Hsiao ◽  
S. J. Chang ◽  
S. B. Wang ◽  
S. P. Chang ◽  
T. C. Li ◽  
...  
2009 ◽  
Vol 20 (32) ◽  
pp. 325605 ◽  
Author(s):  
A P Vajpeyi ◽  
A O Ajagunna ◽  
K Tsagaraki ◽  
M Androulidaki ◽  
A Georgakilas

2011 ◽  
Vol 53 (9) ◽  
pp. 906-913 ◽  
Author(s):  
M. A. Putyato ◽  
B. R. Semyagin ◽  
E. A. Emel’yanov ◽  
N. A. Pakhanov ◽  
V. V. Preobrazhenskii

2003 ◽  
Vol 798 ◽  
Author(s):  
F. Semond ◽  
D. Byrne ◽  
F. Natali ◽  
M. Leroux ◽  
J. Massies ◽  
...  

ABSTRACTIn a recent paper [Phys. Rev. B 68, 153313 (2003)], we reported the first experimental observation of the strong coupling regime in a GaN-based microcavity. The λ/2 GaN optical cavity was grown by molecular beam epitaxy on a Si(111) substrate. The upper mirror is a SiO2/Si3N4 dielectric mirror and the silicon substrate acts as the bottom mirror. With such a relatively simple and low-finesse microcavity, a Rabi splitting of 31 meV was measured at 5K. On the basis of this very encouraging result, approaches to fabricate high-finesse GaN-based cavities exhibiting strong coupling with stable polaritons at room temperature are discussed.


2019 ◽  
Vol 45 (11) ◽  
pp. 1111-1113 ◽  
Author(s):  
R. R. Reznik ◽  
K. P. Kotlyar ◽  
N. V. Kryzhanovskaya ◽  
S. V. Morozov ◽  
G. E. Cirlin

Author(s):  
Н.Р. Григорьева ◽  
И.В. Штром ◽  
Р.В. Григорьев ◽  
И.П. Сошников ◽  
Р.Р. Резник ◽  
...  

The role of EL2 defect in a formation of a photoresponse of an array of radial GaAs/AlGaAs nanowires (x=0.3) n-type grown by molecular beam epitaxy on a p-type silicon substrate was studied. A significant reduction in the recovery time of the photoresponse of nanowires was found in comparison with the bulk crystal during the transition of the EL2-center from the non-photoactive to the normal state.


1990 ◽  
Vol 56 (9) ◽  
pp. 802-804 ◽  
Author(s):  
Y. S. Kim ◽  
S. S. Lee ◽  
R. V. Ramaswamy ◽  
S. Sakai ◽  
Y. C. Kao ◽  
...  

2019 ◽  
Vol 12 ◽  
pp. 1177-1181 ◽  
Author(s):  
Ho Xin Jing ◽  
Che Azurahanim Che Abdullah ◽  
Mohd Zaki Mohd Yusoff ◽  
Azzafeerah Mahyuddin ◽  
Zainuriah Hassan

2012 ◽  
Vol 347 (1) ◽  
pp. 49-52 ◽  
Author(s):  
J. Penuelas ◽  
X. Lu ◽  
N.P. Blanchard ◽  
G. Saint-Girons ◽  
B. Vilquin ◽  
...  

Author(s):  
Aleksey Kacyuba ◽  
Anatoly Dvurechenskii ◽  
Gennady Kamaev ◽  
Vladimir Volodin ◽  
Viktor Kirienko

In this work investigated crystal structure of films formed by molecular beam epitaxy (MBE) of CaSi2 on Si (111), under electron irradiation by the method of Raman light scattering (RS), it was found that a CaSi2 film is formed at the interface between the silicon substrate and the epitaxially growing CaF2 film under the influence of an electron beam.


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