Atomic-Layer-Deposition of SiO2 with Tris(Dimethylamino)Silane (TDMAS) and Ozone Investigated by Infrared Absorption Spectroscopy

2019 ◽  
Vol 13 (1) ◽  
pp. 171-177 ◽  
Author(s):  
Fumihiko Hirose ◽  
Yuta Kinoshita ◽  
Suguru Shibuya ◽  
Hironobu Miya ◽  
Kazuhiro Hirahara ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Absorption Spectroscopy ◽  
Infrared Absorption ◽  
Atomic Layer ◽  
Infrared Absorption Spectroscopy ◽  
Layer Deposition

Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy

2015 ◽  
Vol E98.C (5) ◽  
pp. 382-389 ◽  
Author(s):  
P. Pungboon PANSILA ◽  
Kensaku KANOMATA ◽  
Bashir AHMMAD ◽  
Shigeru KUBOTA ◽  
Fumihiko HIROSE
Keyword(s):  
Atomic Layer Deposition ◽  
Absorption Spectroscopy ◽  
Gallium Oxide ◽  
Room Temperature ◽  
Atomic Layer ◽  
Ir Absorption ◽  
Layer Deposition

In Situ Infrared Absorption Study of Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride

Langmuir ◽  
2018 ◽  
Vol 34 (8) ◽  
pp. 2619-2629 ◽  
Author(s):  
Luis Fabián Peña ◽  
Eric C. Mattson ◽  
Charith E. Nanayakkara ◽  
Kolade A. Oyekan ◽  
Anupama Mallikarjunan ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Atomic Layer Deposition ◽  
Infrared Absorption ◽  
Atomic Layer ◽  
Absorption Study ◽  
Layer Deposition
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