Electromigration Reliability Assessment of Cu-based Metallization Systems by a Wafer-Level Approach

2019 ◽  
Vol 8 (1) ◽  
pp. 157-162
Author(s):  
Maurizio Impronta ◽  
Alessandro Marras ◽  
Ilaria De Munari ◽  
Andrea Scorzoni ◽  
Maria Grazia Valentini
2013 ◽  
Vol 106 ◽  
pp. 195-199 ◽  
Author(s):  
F. Bana ◽  
E. Petitprez ◽  
D. Ney ◽  
L. Arnaud ◽  
Y. Wouters

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