A Film-Thickness Determination of Nitrogen Diffusion in Zirconium Nitride

1968 ◽  
Vol 115 (5) ◽  
pp. 467 ◽  
Author(s):  
C. J. Rosa ◽  
W. C. Hagel
2006 ◽  
Vol 35 (12) ◽  
pp. 2142-2146 ◽  
Author(s):  
J. Joshua Yang ◽  
Chengxiang Ji ◽  
Ying Yang ◽  
Y. Austin Chang ◽  
Feng X. Liu ◽  
...  

2001 ◽  
Vol 671 ◽  
Author(s):  
Michael Gostein ◽  
Paul Lefevre ◽  
Alex A. Maznev ◽  
Michael Joffe

ABSTRACTWe discuss applications of optoacoustic film thickness metrology for characterization of copper chemical-mechanical polishing (CMP). We highlight areas where the use of optoacoustics for CMP characterization provides data complementary to that obtained by other techniques because of its ability to directly measure film thickness with high spatial resolution in a rapid, non-destructive manner. Examples considered include determination of planarization length, measurement of film thickness at intermediate stages of polish, and measurement of arrays of metal lines.


2006 ◽  
Vol 252 (6) ◽  
pp. 2375-2388 ◽  
Author(s):  
Werner Frammelsberger ◽  
Guenther Benstetter ◽  
Janice Kiely ◽  
Richard Stamp

2009 ◽  
Vol 15 (S2) ◽  
pp. 340-341 ◽  
Author(s):  
R Salzer ◽  
A Graff ◽  
M Simon ◽  
F Altmann

Extended abstract of a paper presented at Microscopy and Microanalysis 2009 in Richmond, Virginia, USA, July 26 – July 30, 2009


Author(s):  
C. Klatt ◽  
W. Ensinger ◽  
H. Martin ◽  
G.K. Wolf ◽  
P. Oberschachtsiek ◽  
...  

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