Gas Phase and Surface Chemical Kinetics in Silicon Chemical Vapor deposition

2019 ◽  
Vol 2 (7) ◽  
pp. 107-119 ◽  
Author(s):  
Mitsuo Koshi ◽  
Keiji Matsumoto
2011 ◽  
Vol 116 (1) ◽  
pp. 104-114 ◽  
Author(s):  
Adam M. Boies ◽  
Steven Calder ◽  
Pulkit Agarwal ◽  
Pingyan Lei ◽  
Steven L. Girshick

2017 ◽  
Vol 121 (47) ◽  
pp. 26465-26471 ◽  
Author(s):  
Mewlude Imam ◽  
Laurent Souqui ◽  
Jan Herritsch ◽  
Andreas Stegmüller ◽  
Carina Höglund ◽  
...  

Author(s):  
Sebastian Grimm ◽  
Seung-Jin Baik ◽  
Patrick Hemberger ◽  
Andras Bodi ◽  
Andreas Kempf ◽  
...  

Although aluminium acetylacetonate, Al(C5H7O2)3, is a common precursor for chemical vapor deposition (CVD) of aluminium oxide, its gas phase decomposition is not very well investigated. Here, we studied its thermal...


1999 ◽  
Vol 61-62 ◽  
pp. 176-178 ◽  
Author(s):  
A.N Vorob’ev ◽  
A.E Komissarov ◽  
A.S Segal ◽  
Yu.N Makarov ◽  
S.Yu Karpov ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document