Optical Properties of Silicon Nitride

1973 ◽  
Vol 120 (2) ◽  
pp. 295 ◽  
Author(s):  
Herbert R. Philipp
1990 ◽  
Vol 201 ◽  
Author(s):  
Honglie Shen ◽  
Genqing Yang ◽  
Zuyao Zhou ◽  
Guanqun Xia ◽  
Shichang Zou

AbstractDual implantations of Si+ and P+ into InP:Fe were performed both at 200°C and room temperature. Si+ ions were implanted by 150keV with doses ranging from 5×1013 /cm2 to 1×1015 /cm2, while P+ ions were implanted by 110keV. 160keV and 180keV with doses ranging from 1×l013 /cm2 to 1×1015 /cm2. Hall measurements and photoluminescence spectra were used to characterize the silicon nitride encapsulated annealed samples. It was found that enhanced activation can be obtained by Si+ and P+ dual implantations. The optimal condition for dual implantations is that the atomic distribution of implanted P overlaps that of implanted si with the same implant dose. For a dose of 5×l014 /cm2, the highest activation for dual implants is 70% while the activation for single implant is 40% after annealing at 750°C for 15 minutes. PL spectrum measurement was carried out at temperatures from 11K to 100K. A broad band at about 1.26eV was found in Si+ implanted samples, of which the intensity increased with increasing of the Si dose and decreased with increasing of the co-implant P+ dose. The temperature dependence of the broad band showed that it is a complex (Vp-Sip) related band. All these results indicate that silicon is an amphoteric species in InP.


Computation ◽  
2015 ◽  
Vol 3 (4) ◽  
pp. 657-669 ◽  
Author(s):  
Shu Tao ◽  
Anne Theulings ◽  
Violeta Prodanović ◽  
John Smedley ◽  
Harry van der Graaf

1977 ◽  
Vol 26 (1) ◽  
pp. 129-131
Author(s):  
N. N. Gerasimenko ◽  
T. I. Kovalevskaya ◽  
V. G. Pan'kin ◽  
K. K. Svitashev ◽  
G. M. Tseitlin

1995 ◽  
Vol 77 (12) ◽  
pp. 6534-6541 ◽  
Author(s):  
Sadanand V. Deshpande ◽  
Erdogan Gulari ◽  
Steven W. Brown ◽  
Stephen C. Rand

2005 ◽  
Vol 192 (2-3) ◽  
pp. 225-230 ◽  
Author(s):  
J.M. Lackner ◽  
W. Waldhauser ◽  
R. Berghauser ◽  
R. Ebner ◽  
M. Beutl ◽  
...  

2010 ◽  
Vol 518 (17) ◽  
pp. 4918-4922 ◽  
Author(s):  
S.Zh. Karazhanov ◽  
P. Kroll ◽  
E.S. Marstein ◽  
A. Holt

2008 ◽  
Vol 92 (10) ◽  
pp. 103125 ◽  
Author(s):  
B. M. Zwickl ◽  
W. E. Shanks ◽  
A. M. Jayich ◽  
C. Yang ◽  
A. C. Bleszynski Jayich ◽  
...  

1988 ◽  
Vol 63 (8) ◽  
pp. 2651-2659 ◽  
Author(s):  
Rhett E. Livengood ◽  
Mark A. Petrich ◽  
Dennis W. Hess ◽  
Jeffrey A. Reimer

1999 ◽  
Vol 579 ◽  
Author(s):  
R.M. Valladarest ◽  
A.G. Calles ◽  
Alexander Valladares ◽  
Ariel A. Valladares

ABSTRACTWe simulate α - Si21 –N2: H that contains 6-atom boat-type rings and a – Si17–iNi: H that contains 5-atom planar rings, where i = 0, 1 or 4. The simulations were carried out using the DFT-LDA approximation contained in the DMol code of MSI. We report calculations of impurity levels and relate these to the size of the gap and to the optical absorption curves for each cluster. A comparison is made between the two α – SiN clusters studied to analyze the effect of the ring topology.


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