Investigating Electronic and Chemical Properties of Ge/GeOxNy/HfO2 Gate Stacks : High-Resolution Photoelectron Spectroscopy Using Synchrotron Radiation
2001 ◽
Vol 280
(1-3)
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pp. 150-155
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Keyword(s):
2018 ◽
Vol 70
(2)
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pp. 385-392
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2016 ◽
Vol 18
(48)
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pp. 33233-33239
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1997 ◽
Vol 68
(4)
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pp. 1694-1702
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2018 ◽
Vol 14
(S343)
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pp. 548-549