Low Temperature Silcore® Deposition of Undoped and Doped Silicon Films

2019 ◽  
Vol 3 (2) ◽  
pp. 203-215 ◽  
Author(s):  
Pamela R. Fischer ◽  
Steven Van Aerde ◽  
Ed Oosterlaken ◽  
Bart Bozon ◽  
Peter M. Zagwijn ◽  
...  
Keyword(s):  
Low Temperature ◽  
Silicon Films ◽  
Doped Silicon

Low temperature (≤ 600°C) semi-insulating oxygen-doped silicon films by the PECVD technique for large area power applications

1995 ◽  
Vol 28 (1-4) ◽  
pp. 451-454
Author(s):  
F.J. Clough ◽  
A.O. Brown ◽  
S.N. Ekkanath Madathil ◽  
W.I. Milne
Keyword(s):  
Low Temperature ◽  
Silicon Films ◽  
Large Area ◽  
Doped Silicon

Low-temperature (≤600 °C) semi-insulating oxygen-doped silicon films by the PECVD technique for large-area power applications

1995 ◽  
Vol 270 (1-2) ◽  
pp. 517-521 ◽  
Author(s):  
F.J. Clough ◽  
A.O. Brown ◽  
S.N.Ekkanath Madathil ◽  
W.I. Milne
Keyword(s):  
Low Temperature ◽  
Silicon Films ◽  
Large Area ◽  
Doped Silicon

Low-temperature epitaxial growth of in-situ doped silicon films

1991 ◽  
Vol 115 (1-4) ◽  
pp. 439-442 ◽  
Author(s):  
Roland Kircher ◽  
Makoto Furuno ◽  
Junichi Murota ◽  
Shoichi Ono
Keyword(s):  
Low Temperature ◽  
Epitaxial Growth ◽  
Silicon Films ◽  
Doped Silicon

Low-temperature growth of in situ phosphorus-doped silicon films: two-step growth utilizing amorphous silicon buffers

2000 ◽  
Vol 369 (1-2) ◽  
pp. 185-188
Author(s):  
Kyu-Hwan Shim ◽  
Hong-Seung Kim ◽  
Jeong-Yong Lee ◽  
Jin-Yeoung Kang ◽  
Min Kyu Song
Keyword(s):  
Low Temperature ◽  
Amorphous Silicon ◽  
Silicon Films ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Doped Silicon ◽  
Step Growth ◽  
Phosphorus Doped
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