Thermal Characteristics of the  H 2 SO 4 ‐  H 2 O 2 Silicon Wafer Cleaning Solution

1979 ◽  
Vol 126 (8) ◽  
pp. 1428-1430 ◽  
Author(s):  
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J. B. Price ◽  
P. J. Tobin ◽  
J. Peavey ◽  
K. Kobold
1998 ◽  
Vol 65-66 ◽  
pp. 43-48 ◽  
Author(s):  
H. Kanetaka ◽  
Toshihiko Kujime ◽  
H. Yazaki ◽  
T. Kezuka ◽  
Tadahiro Ohmi

Author(s):  
D. Scott Becker ◽  
William R. Schmidt ◽  
Charlie A. Peterson ◽  
Don C. Burkman

2009 ◽  
Vol 145-146 ◽  
pp. 27-30 ◽  
Author(s):  
J.M. Goodson ◽  
R. Nagarajan

1996 ◽  
Vol 368 (1-3) ◽  
pp. 163-178 ◽  
Author(s):  
M.K. Weldon ◽  
V.E. Marsico ◽  
Y.J. Chabal ◽  
D.R. Hamann ◽  
S.B. Christman ◽  
...  

2011 ◽  
Vol 158 (1) ◽  
pp. H55 ◽  
Author(s):  
V. A. Andreev ◽  
E. M. Freer ◽  
J. M. de Larios ◽  
J. M. Prausnitz ◽  
C. J. Radke

1994 ◽  
Author(s):  
Joong-Suck Jeon ◽  
Srini Raghavan ◽  
John K. Lowell ◽  
Valerie Wenner

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