Influence of Substrate Temperature on the Morphology of Al x Ga1 − x As Grown by Molecular Beam Epitaxy

1982 ◽  
Vol 129 (4) ◽  
pp. 824-826 ◽  
Author(s):  
H. Morkoç ◽  
T. J. Drummond ◽  
W. Kopp ◽  
R. Fischer
2018 ◽  
Vol 766 ◽  
pp. 398-401
Author(s):  
D. Jarosz ◽  
H. Teisseyre ◽  
M. Stachowicz ◽  
A. Pieniążek ◽  
S. Kret ◽  
...  

1991 ◽  
Vol 241 ◽  
Author(s):  
Bijan Tadayon ◽  
Mohammad Fatemi ◽  
Saied Tadayon ◽  
F. Moore ◽  
Harry Dietrich

ABSTRACTWe present here the results of a study on the effect of substrate temperature, Ts, on the electrical and physical characteristics of low temperature (LT) molecular beam epitaxy GaAs layers. Hall measurements have been performed on the asgrown samples and on samples annealed at 610 °C and 850 °C. Si implantation into these layers has also been investigated.


2001 ◽  
Vol 227-228 ◽  
pp. 266-270 ◽  
Author(s):  
Yasuaki Tatsuoka ◽  
Masaya Uemura ◽  
Takahiro Kitada ◽  
Satoshi Shimomura ◽  
Satoshi Hiyamizu

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