Germanium Implantation into Silicon: An Alternate Pre‐Amorphization/Rapid Thermal Annealing Procedure for Shallow Junction Formation

1984 ◽  
Vol 131 (4) ◽  
pp. 943-945 ◽  
Author(s):  
D. K. Sadana ◽  
W. Maszara ◽  
J. J. Wortmann ◽  
G. A. Rozgonyi ◽  
W. K. Chu
Keyword(s):  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Shallow Junction ◽  
Junction Formation ◽  
Annealing Procedure

Rapid thermal annealing of spin-coated phosphoric acid films for shallow junction formation

1997 ◽  
Vol 71 (3) ◽  
pp. 392-394 ◽  
Author(s):  
S. Sivoththaman ◽  
W. Laureys ◽  
J. Nijs ◽  
R. Mertens
Keyword(s):  
Phosphoric Acid ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Shallow Junction ◽  
Junction Formation

Rapid thermal annealing of Si paste film and pn-junction formation

2020 ◽  
Vol 31 (38) ◽  
pp. 385202
Author(s):  
Huan Zhu ◽  
Morihiro Sakamoto ◽  
Ting Pan ◽  
Takaya Fujisaki ◽  
Hiroshige Matsumoto ◽  
...  
Keyword(s):  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Pn Junction ◽  
Junction Formation
Sign in / Sign up

Export Citation Format

Share Document