Rapid thermal annealing of spin-coated phosphoric acid films for shallow junction formation

S. Sivoththaman; W. Laureys; J. Nijs; R. Mertens

doi:10.1063/1.119547

Rapid thermal annealing of spin-coated phosphoric acid films for shallow junction formation

Applied Physics Letters ◽

10.1063/1.119547 ◽

1997 ◽

Vol 71 (3) ◽

pp. 392-394 ◽

Cited By ~ 14

Author(s):

S. Sivoththaman ◽

W. Laureys ◽

J. Nijs ◽

R. Mertens

Keyword(s):

Phosphoric Acid ◽

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Shallow Junction ◽

Junction Formation

Download Full-text

Shallow junction formation by boron implantation with energies between 2 and 5 keV and rapid thermal annealing

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/0168-583x(89)90306-6 ◽

1989 ◽

Vol 37-38 ◽

pp. 823-827 ◽

Cited By ~ 13

Author(s):

R. Kakoschke ◽

K. Ehinger

Keyword(s):

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Shallow Junction ◽

Junction Formation ◽

Boron Implantation

Download Full-text

Ultra-shallow junction formation by spike annealing in a lamp-based or hot-walled rapid thermal annealing system: effect of ramp-up rate

Materials Science in Semiconductor Processing ◽

10.1016/s1369-8001(98)00030-4 ◽

1998 ◽

Vol 1 (3-4) ◽

pp. 237-241 ◽

Cited By ~ 19

Author(s):

Aditya Agarwal ◽

Anthony T. Fiory ◽

Hans-Joachim L. Gossmann ◽

Conor S. Rafferty ◽

Peter Frisella

Keyword(s):

Thermal Annealing ◽

Rapid Thermal Annealing ◽

System Effect ◽

Shallow Junction ◽

Junction Formation ◽

Spike Annealing

Download Full-text

Germanium Implantation into Silicon: An Alternate Pre‐Amorphization/Rapid Thermal Annealing Procedure for Shallow Junction Formation

Journal of The Electrochemical Society ◽

10.1149/1.2115733 ◽

1984 ◽

Vol 131 (4) ◽

pp. 943-945 ◽

Cited By ~ 64

Author(s):

D. K. Sadana ◽

W. Maszara ◽

J. J. Wortmann ◽

G. A. Rozgonyi ◽

W. K. Chu

Keyword(s):

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Shallow Junction ◽

Junction Formation ◽

Annealing Procedure

Download Full-text

Ultra-shallow junction formation using conventional ion implantation and rapid thermal annealing

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924147 ◽

2003 ◽

Cited By ~ 8

Author(s):

A. Agarwal

Keyword(s):

Ion Implantation ◽

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Shallow Junction ◽

Junction Formation

Download Full-text

Modeling rapid thermal annealing processes for shallow junction formation in silicon

10.1109/iedm.1983.190593 ◽

1983 ◽

Cited By ~ 2

Author(s):

R.B. Fair ◽

J.J. Wo ◽

J. Liu

Keyword(s):

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Shallow Junction ◽

Junction Formation

Download Full-text

Ion Implantation and Rapid Thermal Annealing in Synergy for Shallow Junction Formation

phys stat sol (a) ◽

10.1002/pssa.2211580115 ◽

1996 ◽

Vol 158 (1) ◽

pp. 117-136 ◽

Cited By ~ 7

Author(s):

W. Lerch

Keyword(s):

Ion Implantation ◽

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Shallow Junction ◽

Junction Formation

Download Full-text

N+shallow junction formation using plasma doping and rapid thermal annealing

2007 International Semiconductor Device Research Symposium ◽

10.1109/isdrs.2007.4422355 ◽

2007 ◽

Cited By ~ 1

Author(s):

Seong Ho Kong ◽

Ho Jung ◽

Jeong Eun Kim ◽

Seung Woo Do ◽

Jae Geun Oh ◽

...

Keyword(s):

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Shallow Junction ◽

Plasma Doping ◽

Junction Formation

Download Full-text

Rapid thermal annealing of Si paste film and pn-junction formation

Nanotechnology ◽

10.1088/1361-6528/ab9aed ◽

2020 ◽

Vol 31 (38) ◽

pp. 385202

Author(s):

Huan Zhu ◽

Morihiro Sakamoto ◽

Ting Pan ◽

Takaya Fujisaki ◽

Hiroshige Matsumoto ◽

...

Keyword(s):

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Pn Junction ◽

Junction Formation

Download Full-text

Process interactions between low-energy ion implantation and rapid-thermal annealing for optimized ultrashallow junction formation

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.591212 ◽

2000 ◽

Vol 18 (1) ◽

pp. 462 ◽

Cited By ~ 10

Author(s):

A. J. Murrell ◽

E. J. H. Collart ◽

M. A. Foad ◽

D. Jennings

Keyword(s):

Ion Implantation ◽

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Low Energy ◽

Junction Formation ◽

Ultrashallow Junction

Download Full-text

Effect of number of laser pulses on p + /n silicon ultra-shallow junction formation during non-melt ultra-violet laser thermal annealing

Materials Science in Semiconductor Processing ◽

10.1016/j.mssp.2016.12.014 ◽

2017 ◽

Vol 60 ◽

pp. 34-39 ◽

Cited By ~ 3

Author(s):

Sang Min Jung ◽

Chul Jin Park ◽

Hongsik Jeong ◽

Moo Whan Shin

Keyword(s):

Thermal Annealing ◽

Ultra Violet ◽

Laser Pulses ◽

Shallow Junction ◽

Junction Formation

Download Full-text