The Effect of Oxygen in the Si Substrate on Mo, W, Ti, and Co Silicide Growth by Infrared Laser Heating

1990 ◽  
Vol 137 (8) ◽  
pp. 2618-2623 ◽  
Author(s):  
H. S. Lee ◽  
G. J. Wolga
Keyword(s):  
Laser Heating ◽  
Infrared Laser ◽  
Si Substrate ◽  
Silicide Growth ◽  
Effect Of Oxygen

Oxygen Effect and Redistribution in Cobalt Silicide Formation

1983 ◽  
Vol 25 ◽  
Author(s):  
Chuen-Der Lien ◽  
Marc-A. Nicolet
Keyword(s):  
Growth Rate ◽  
Dose Range ◽  
Oxygen Effect ◽  
Cobalt Silicide ◽  
Silicide Formation ◽  
Si Substrate ◽  
Silicide Growth ◽  
Two Phases ◽  
Effect Of Oxygen ◽  
Kinetics Of

ABSTRACT18O was implanted in the Si substrate or in the Co overlayer to study the effect of oxygen and its redistribution during Co silicides formation. Implanted and unimplanted samples were annealed in vacuum at 450°C for different durations. Over the investigated dose range of 0.5 to 2 × 101618O/cm2 in the Co film, the phases formed upon annealing are Co2Si and CoSi, as for the unimplanted samples. The kinetics of the silicide growth is changed little by the presence of oxygen in the Co film. Oxygen accumulates at the Co2Si/Co interface. When the oxygen is implanted in the Si substrate, the higher the oxygen dose is, the slower (fasteil the growth rate of CoSi(Co2Si) becomes. Below 1 × 1016 O/cm, both phases (i.e. CoSi and Co2Si) still form; above 2 × 1016 O/cm2 , only Co2Si formsWhen two phases form, the oxygen moves deep into the Si substrate; when only Co2Si forms, the oxygen moves toward the surface.

Nanomaterial Coating on Micro-Hotplate By EHD Inkjet Printing with in-Site Infrared Laser Heating

2020 ◽  
Vol MA2020-01 (30) ◽  
pp. 2304-2304
Author(s):  
Guanyu Yao ◽  
Jun Yu ◽  
Hao Wu ◽  
Zhongzhou Li ◽  
Huichao Zhu ◽  
...  
Keyword(s):  
Inkjet Printing ◽  
Laser Heating ◽  
Infrared Laser

Numerical analysis of infrared laser heating in thermoluminescent material layers: The focused laser case

1989 ◽  
Vol 66 (7) ◽  
pp. 3407-3409 ◽  
Author(s):  
M. E. Grupen‐Shemansky ◽  
K. J. Kearfott ◽  
E. D. Hirleman
Keyword(s):  
Numerical Analysis ◽  
Laser Heating ◽  
Infrared Laser

scholarly journals Formation of the domain structure in CLN under the pyroelectric field induced by pulse infrared laser heating

AIP Advances ◽  
2015 ◽  
Vol 5 (10) ◽  
pp. 107110 ◽  
Author(s):  
V. Ya. Shur ◽  
M. S. Kosobokov ◽  
E. A. Mingaliev ◽  
V. R. Karpov
Keyword(s):  
Domain Structure ◽  
Laser Heating ◽  
Infrared Laser

Pulsed laser deposition of Pb(Zr0.52Ti0.48)O3thin film on cobalt ferrite nano-seed layered Pt(111)/Si substrate: effect of oxygen pressure

2014 ◽  
Vol 87 (7) ◽  
pp. 666-675 ◽  
Author(s):  
M. Khodaei ◽  
S.A. Seyyed Ebrahimi ◽  
Yong Jun Park ◽  
Seungwoo Song ◽  
Hyun Myung Jang ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Oxygen Pressure ◽  
Cobalt Ferrite ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Substrate Effect ◽  
Si Substrate ◽  
Effect Of Oxygen
Sign in / Sign up

Export Citation Format

Share Document