Design and Verification of Nearly Ideal Flow and Heat Transfer in a Rotating Disk Chemical Vapor Deposition Reactor

1991 ◽  
Vol 138 (6) ◽  
pp. 1806-1816 ◽  
Author(s):  
William G. Breiland ◽  
Greg H. Evans
Keyword(s):  
Heat Transfer ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Rotating Disk ◽  
Chemical Vapor Deposition Reactor ◽  
Ideal Flow ◽  
Flow And Heat Transfer

A Numerical Model of the Flow and Heat Transfer in a Rotating Disk Chemical Vapor Deposition Reactor

1987 ◽  
Vol 109 (4) ◽  
pp. 928-935 ◽  
Author(s):  
G. Evans ◽  
R. Greif
Keyword(s):  
Heat Transfer ◽  
Nusselt Number ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Finite Size ◽  
Chemical Vapor ◽  
Rotating Disk ◽  
Temperature Fields ◽  
Navier Stokes ◽  
Flow And Heat Transfer

Steady, laminar, axisymmetric, and circumferentially uniform flow and heat transfer, including the effects of variable properties and buoyancy, have been modeled within a rotating disk chemical vapor deposition (CVD) reactor. The reactor is oriented vertically, with the hot, isothermal, spinning disk facing upward. The Navier–Stokes and energy equations have been solved for the carrier gas helium. The solutions have been obtained over a range of parameters, which is of importance in CVD applications. The primary parameters are the ratio of the disk temperature to the free stream temperature Tw/T∞, the disk Reynolds number Re = rd2ω/ν∞, a mixed convection parameter Gr/Re3/2 = g(ρ∞ − ρw)/(ρwωων∞), the dimensionless inlet velocity u∞/ων∞, and two geometric parameters ro/rd and L/rd. Results are obtained for the velocity and the temperature fields and for the heat flux at the surface of the rotating disk. Comparisons are made with the one-dimensional, variable-property (excluding buoyant effects), infinite rotating disk solutions of Pollard and Newman. Results are presented in terms of a local Nusselt number. The potential uniformity of CVD in this geometry can be inferred from the variation of the Nusselt number over the surface of the rotating disk. The effects of buoyancy and the finite size of the rotating disk within the cylindrical reactor are clearly evident in the present work.

Gas flow and heat transfer in a pancake chemical vapor deposition reactor

1995 ◽  
Vol 151 (3-4) ◽  
pp. 375-383 ◽  
Author(s):  
Hitoshi Habuka ◽  
Masanori Mayusumi ◽  
Naoto Tate ◽  
Masatake Katayama
Keyword(s):  
Heat Transfer ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Gas Flow ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Reactor ◽  
Flow And Heat Transfer
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