Laser-Induced Fluorescence Measurements and Kinetic Analysis of Si Atom Formation in a Rotating Disk Chemical Vapor Deposition Reactor

Pauline Ho; Michael E. Coltrin; William G. Breiland

doi:10.1021/j100091a032

Laser-Induced Fluorescence Measurements and Kinetic Analysis of Si Atom Formation in a Rotating Disk Chemical Vapor Deposition Reactor

The Journal of Physical Chemistry ◽

10.1021/j100091a032 ◽

1994 ◽

Vol 98 (40) ◽

pp. 10138-10147 ◽

Cited By ~ 93

Author(s):

Pauline Ho ◽

Michael E. Coltrin ◽

William G. Breiland

Keyword(s):

Chemical Vapor Deposition ◽

Kinetic Analysis ◽

Vapor Deposition ◽

Chemical Vapor ◽

Rotating Disk ◽

Laser Induced Fluorescence ◽

Chemical Vapor Deposition Reactor ◽

Fluorescence Measurements

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Design and Verification of Nearly Ideal Flow and Heat Transfer in a Rotating Disk Chemical Vapor Deposition Reactor

Journal of The Electrochemical Society ◽

10.1149/1.2085878 ◽

1991 ◽

Vol 138 (6) ◽

pp. 1806-1816 ◽

Cited By ~ 76

Author(s):

William G. Breiland ◽

Greg H. Evans

Keyword(s):

Heat Transfer ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Rotating Disk ◽

Chemical Vapor Deposition Reactor ◽

Ideal Flow ◽

Flow And Heat Transfer

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Effects of Boundary Conditions on the Flow and Heat Transfer in a Rotating Disk Chemical Vapor Deposition Reactor

Numerical Heat Transfer Part B Fundamentals ◽

10.1080/10407798708552577 ◽

1987 ◽

Vol 12 (2) ◽

pp. 243-252

Author(s):

G. Evans ◽

R. Greif

Keyword(s):

Heat Transfer ◽

Chemical Vapor Deposition ◽

Boundary Conditions ◽

Vapor Deposition ◽

Chemical Vapor ◽

Rotating Disk ◽

Chemical Vapor Deposition Reactor ◽

Flow And Heat Transfer

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A numerical/experimental investigation of microcontamination in a rotating disk chemical vapor deposition reactor

10.1063/1.1354413 ◽

2001 ◽

Author(s):

R. W. Davis

Keyword(s):

Experimental Investigation ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Rotating Disk ◽

Chemical Vapor Deposition Reactor

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Numerical modeling of particle dynamics in a rotating disk chemical vapor deposition reactor

Journal of Crystal Growth ◽

10.1016/0022-0248(93)90079-c ◽

1993 ◽

Vol 132 (3-4) ◽

pp. 513-522 ◽

Cited By ~ 31

Author(s):

R.W. Davis ◽

E.F. Moore ◽

M.R. Zachariah

Keyword(s):

Numerical Modeling ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Rotating Disk ◽

Particle Dynamics ◽

Chemical Vapor Deposition Reactor

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COMPUTATIONAL ASSESSEMENT OF OPTIMAL FLOW RATE FOR STABLE FLOW IN A VERTICAL ROTATING DISk CHEMICAL VAPOR DEPOSITION REACTOR

Journal of computational fluids engineering ◽

10.6112/kscfe.2012.17.1.086 ◽

2012 ◽

Vol 17 (1) ◽

pp. 86-93 ◽

Cited By ~ 1

Author(s):

H.S. Kwak

Keyword(s):

Chemical Vapor Deposition ◽

Flow Rate ◽

Vapor Deposition ◽

Chemical Vapor ◽

Rotating Disk ◽

Chemical Vapor Deposition Reactor ◽

Optimal Flow ◽

Stable Flow

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EFFECTS OF BOUNDARY CONDITIONS ON THE FLOW AND HEAT TRANSFER IN A ROTATING DISK CHEMICAL VAPOR DEPOSITION REACTOR

Numerical Heat Transfer ◽

10.1080/10407788708913584 ◽

1987 ◽

Vol 12 (2) ◽

pp. 243-252 ◽

Cited By ~ 44

Author(s):

G. Evans ◽

R. Greif

Keyword(s):

Heat Transfer ◽

Chemical Vapor Deposition ◽

Boundary Conditions ◽

Vapor Deposition ◽

Chemical Vapor ◽

Rotating Disk ◽

Chemical Vapor Deposition Reactor ◽

Flow And Heat Transfer

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Mixed binary convection in a rotating disk chemical vapor deposition reactor

International Journal of Heat and Mass Transfer ◽

10.1016/0017-9310(96)00092-0 ◽

1997 ◽

Vol 40 (3) ◽

pp. 737-744 ◽

Cited By ~ 6

Author(s):

W.S. Winters ◽

G.H. Evans ◽

R. Greif

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Rotating Disk ◽

Chemical Vapor Deposition Reactor

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A Mathematical Model of the Fluid Mechanics and Gas‐Phase Chemistry in a Rotating Disk Chemical Vapor Deposition Reactor

Journal of The Electrochemical Society ◽

10.1149/1.2096750 ◽

1989 ◽

Vol 136 (3) ◽

pp. 819-829 ◽

Cited By ~ 190

Author(s):

Michael E. Coltrin ◽

Robert J. Kee ◽

Greg H. Evans

Keyword(s):

Mathematical Model ◽

Chemical Vapor Deposition ◽

Fluid Mechanics ◽

Gas Phase ◽

Vapor Deposition ◽

Chemical Vapor ◽

Rotating Disk ◽

Chemical Vapor Deposition Reactor ◽

Gas Phase Chemistry ◽

Phase Chemistry

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HEAT TRANSFER AND FLOW STABILITY IN A ROTATING DISK/STAGNATION FLOW CHEMICAL VAPOR DEPOSITION REACTOR

Numerical Heat Transfer Part A Applications ◽

10.1080/10407789708914069 ◽

1997 ◽

Vol 31 (8) ◽

pp. 867-879 ◽

Cited By ~ 13

Author(s):

S. Joh ◽

G. H. Evans

Keyword(s):

Heat Transfer ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Rotating Disk ◽

Flow Stability ◽

Stagnation Flow ◽

Chemical Vapor Deposition Reactor

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Heat transfer and flow stability in a rotating disk/stagnation flow chemical vapor deposition reactor

10.2172/481615 ◽

1996 ◽

Author(s):

S. Joh ◽

G.H. Evans

Keyword(s):

Heat Transfer ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Rotating Disk ◽

Flow Stability ◽

Stagnation Flow ◽

Chemical Vapor Deposition Reactor

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