Compositional Analysis and Capacitance‐Voltage Properties of TiO2 Films by Low Pressure Metal‐Organic Chemical Vapor Deposition

Tae‐Kyung Won; Soon‐Gill Yoon; Ho‐Gi Kim

doi:10.1149/1.2069068

Compositional Analysis and Capacitance‐Voltage Properties of TiO2 Films by Low Pressure Metal‐Organic Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2069068 ◽

1992 ◽

Vol 139 (11) ◽

pp. 3284-3288 ◽

Cited By ~ 34

Author(s):

Tae‐Kyung Won ◽

Soon‐Gill Yoon ◽

Ho‐Gi Kim

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Compositional Analysis ◽

Chemical Vapor ◽

Low Pressure ◽

Organic Chemical ◽

Tio2 Films ◽

Capacitance Voltage ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

Download Full-text

Low pressure metal-organic chemical vapor deposition of InP/InAlAs/InGaAs quantum wires

Journal of Crystal Growth ◽

10.1016/s0022-0248(96)00612-4 ◽

1997 ◽

Vol 170 (1-4) ◽

pp. 590-594 ◽

Cited By ~ 5

Author(s):

M. Kappelt ◽

V. Türck ◽

M. Grundmann ◽

H. Cerva ◽

D. Bimberg

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Quantum Wires ◽

Chemical Vapor ◽

Low Pressure ◽

Organic Chemical ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

Download Full-text

InP by Planar Reactive Deposition and GaAs by Low Pressure Metal Organic Chemical Vapor Deposition.

10.21236/ada099993 ◽

1981 ◽

Author(s):

K. Zanio

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Organic Chemical ◽

Reactive Deposition ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

Download Full-text

A quantum well δ-doped GaAs FET fabricated by low-pressure metal organic chemical vapor deposition

Solid-State Electronics ◽

10.1016/0038-1101(91)90139-p ◽

1991 ◽

Vol 34 (6) ◽

pp. 649-653 ◽

Cited By ~ 6

Author(s):

W.C. Hsu ◽

W. Lin ◽

C. Wang

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Well ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Organic Chemical ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

Download Full-text

Cobalt oxide thin film low pressure metal-organic chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2014.07.029 ◽

2014 ◽

Vol 567 ◽

pp. 8-13 ◽

Cited By ~ 13

Author(s):

Stefan Schmid ◽

René Hausbrand ◽

Wolfram Jaegermann

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Cobalt Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Oxide Thin Film ◽

Organic Chemical ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

Download Full-text

Low-Pressure Metal–Organic Chemical Vapor Deposition of Transparent and p-Type Conducting CuCrO2 Thin Films with High Conductivity

Chemical Vapor Deposition ◽

10.1002/cvde.200304147 ◽

2003 ◽

Vol 9 (5) ◽

pp. 238-240 ◽

Cited By ~ 58

Author(s):

S. Mahapatra ◽

S.A. Shivashankar

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

High Conductivity ◽

Organic Chemical ◽

Metal Organic ◽

P Type ◽

Organic Chemical Vapor Deposition

Download Full-text

InAsSbP/InAsSb/InAs laser diodes (λ=3.2 μm) grown by low-pressure metal–organic chemical-vapor deposition

Applied Physics Letters ◽

10.1063/1.119298 ◽

1997 ◽

Vol 70 (1) ◽

pp. 40-42 ◽

Cited By ~ 19

Author(s):

J. Diaz ◽

H. Yi ◽

A. Rybaltowski ◽

B. Lane ◽

G. Lukas ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Laser Diodes ◽

Chemical Vapor ◽

Low Pressure ◽

Organic Chemical ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

Download Full-text

Three-step growth of metamorphic GaAs on Si(001) by low-pressure metal organic chemical vapor deposition

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.4820914 ◽

2013 ◽

Vol 31 (5) ◽

pp. 051211 ◽

Cited By ~ 15

Author(s):

Yifan Wang ◽

Qi Wang ◽

Zhigang Jia ◽

Xiaoyi Li ◽

Can Deng ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Organic Chemical ◽

Gaas On Si ◽

Metal Organic ◽

Step Growth ◽

Organic Chemical Vapor Deposition

Download Full-text

Synthesis of aluminium and gallium fluoroalkoxide compounds and the low pressure metal-organic chemical vapor deposition of gallium oxide films

Journal of Materials Chemistry ◽

10.1039/a808460b ◽

1999 ◽

Vol 9 (4) ◽

pp. 929-935 ◽

Cited By ~ 40

Author(s):

Liliana Mîinea ◽

Seigi Suh ◽

Simon G. Bott ◽

Jia-Rui Liu ◽

Wei-Kan Chu ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Gallium Oxide ◽

Oxide Films ◽

Chemical Vapor ◽

Low Pressure ◽

Organic Chemical ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

Download Full-text

Synthesis of pyrite (FeS2) thin films by low pressure metal-organic chemical vapor deposition

Journal de Physique IV (Proceedings) ◽

10.1051/jp4:1999877 ◽

1999 ◽

Vol 09 (PR8) ◽

pp. Pr8-613-Pr8-620 ◽

Cited By ~ 1

Author(s):

B. Meester ◽

L. Reijnen ◽

A. Goossens ◽

J. Schoonman

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Organic Chemical ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

Download Full-text

Enhancement of growth rate due to tin doping in GaAs epilayer grown by low pressure metal‐organic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.332690 ◽

1983 ◽

Vol 54 (9) ◽

pp. 5464-5465 ◽

Cited By ~ 11

Author(s):

C. Y. Chang ◽

M. K. Lee ◽

Y. K. Su ◽

W. C. Hsu

Keyword(s):

Growth Rate ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Organic Chemical ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

Download Full-text