Thermal Stability of Cu / CoSi2 Contacted p+n Shallow Junction with and without TiW Diffusion Barrier

1994 ◽  
Vol 141 (10) ◽  
pp. 2804-2810 ◽  
Author(s):  
Jung‐Chao Chiou ◽  
Mao‐Chieh Chen
Keyword(s):  
Thermal Stability ◽  
Diffusion Barrier ◽  
Shallow Junction ◽  
Thermal Stability Of

Thermal stability of PECVD W-B-N thin film as a diffusion barrier

1997 ◽  
Author(s):  
YongTae Kim ◽  
Dong J. Kim ◽  
Chang W. Lee ◽  
Jong-Wan Park
Keyword(s):  
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Thermal Stability ◽  
Diffusion Barrier ◽  
Thermal Stability Of

Thermal stability of ultra thin Zr-B-N films as diffusion barrier between Cu and Si

2020 ◽  
Vol 527 ◽  
pp. 146810
Author(s):  
Y. Meng ◽  
Z.X. Song ◽  
Y.H. Li ◽  
D. Qian ◽  
W. Hu ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Diffusion Barrier ◽  
Thermal Stability Of

scholarly journals Thermal stability of Mg/Co multilayer with B_4C, Mo or Zr diffusion barrier layers

2011 ◽  
Vol 19 (22) ◽  
pp. 21849 ◽  
Author(s):  
Jingtao Zhu ◽  
Sika Zhou ◽  
Haochuan Li ◽  
Zhanshan Wang ◽  
Philippe Jonnard ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Diffusion Barrier ◽  
Barrier Layers ◽  
Thermal Stability Of

Thermal Stability of Amorphous-like WNx/W Bilayered Diffusion Barrier for Chemical Vapor Deposited-Tungsten/p+-Si Contact System

1999 ◽  
Vol 38 (Part 1, No. 3A) ◽  
pp. 1343-1351 ◽  
Author(s):  
Kow-Ming Chang ◽  
I-Chung Deng ◽  
Ta-Hsun Yeh ◽  
Kuen-Der Lain ◽  
Chao-Ming Fu
Keyword(s):  
Thermal Stability ◽  
Diffusion Barrier ◽  
Chemical Vapor ◽  
Contact System ◽  
Chemical Vapor Deposited ◽  
Thermal Stability Of

Thermal Stability of Cu/NiSi-Contacted p+n Shallow Junction

2004 ◽  
Vol 43 (9A) ◽  
pp. 5997-6000 ◽  
Author(s):  
Chao-Chun Wang ◽  
Hsin-Hung Lin ◽  
Mao-Chieh Chen
Keyword(s):  
Thermal Stability ◽  
Shallow Junction ◽  
Thermal Stability Of
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