CH 4 / H 2 / AR Electron Cyclotron Resonance Plasma Etching for GaAs ‐ Based Field Effect Transistors
1995 ◽
Vol 142
(8)
◽
pp. 2849-2852
◽
2002 ◽
Vol 31
(7)
◽
pp. 749-753
◽
2017 ◽
Vol 35
(6)
◽
pp. 061303
◽
1996 ◽
Vol 14
(5)
◽
pp. 2827-2834
◽