scholarly journals The Reactive Ion Etching of Transparent Electrodes for Flat Panel Displays Using Ar / Cl2 Plasmas

1995 ◽  
Vol 142 (12) ◽  
pp. 4285-4289 ◽  
Author(s):  
J. Molloy ◽  
P. Maguire ◽  
S. J. Laverty ◽  
J. A. McLaughlin
Keyword(s):  
Reactive Ion Etching ◽  
Flat Panel Displays ◽  
Transparent Electrodes ◽  
Flat Panel ◽  
Ion Etching

In Situ Design of Experiments for A Reactive Ion Etching Process

1999 ◽  
Vol 569 ◽  
Author(s):  
Cecilia G. Galarza ◽  
Pete Klimecky ◽  
Pramod P. Khargonekar ◽  
Fred L. Terry
Keyword(s):  
Design Of Experiments ◽  
Plasma Etching ◽  
Etch Rate ◽  
Reactive Ion Etching ◽  
Etching Process ◽  
Flat Panel Displays ◽  
Flat Panel ◽  
Ion Etching ◽  
Spatial Uniformity

ABSTRACTWe introduce a new procedure to perform a design of experiments (DOE) for plasma etching processes. In particular, we use in situ etch rate estimations to maximize the number of observable setpoints during a single run of the etching process. This procedure is applied to characterize the spatial uniformity of a plasma chamber used in the manufacturing of flat panel displays.

Evaluating Alternate Visualization Methods for Microsurgery: 2D and 3D Optical Microscopes and Flat-Panel Displays

2012 ◽  
Author(s):  
Michael Sackllah ◽  
Denny Yu ◽  
Charles Woolley ◽  
Steven Kasten ◽  
Thomas J. Armstrong
Keyword(s):  
Flat Panel Displays ◽  
Flat Panel ◽  
2D And 3D

Magnetron Reactive Ion Etching of GaAs and AIGaAs in CH4/H2/Ar Plasmas.

1996 ◽  
Author(s):  
George F. McLane ◽  
Paul Cooke ◽  
Robert P. Moerkirk
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching

Modification of the n-Surface Profile of AlGaInN LEDs by Changing the Gas-Mixture Composition During Reactive Ion Etching

2020 ◽  
Vol 54 (6) ◽  
pp. 672-676
Author(s):  
L. K. Markov ◽  
I. P. Smirnova ◽  
M. V. Kukushkin ◽  
A. S. Pavluchenko
Keyword(s):  
Reactive Ion Etching ◽  
Surface Profile ◽  
Mixture Composition ◽  
Gas Mixture ◽  
Ion Etching

Reactive ion etching of III-V compounds using C2H6/H2

1988 ◽  
Vol 24 (13) ◽  
pp. 798 ◽  
Author(s):  
T. Matsui ◽  
H. Sugimoto ◽  
T. Ohishi ◽  
H. Ogata
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching

Two mask step polysilicon TFT technology for flat panel displays

1988 ◽  
Vol 24 (3) ◽  
pp. 156 ◽  
Author(s):  
B. Loisel ◽  
L. Haji ◽  
P. Sangouard ◽  
M. Sarret
Keyword(s):  
Flat Panel Displays ◽  
Flat Panel ◽  
Polysilicon Tft

GaInAsP/InP mass transport laser monolithically integrated with photodetector using reactive ion etching

1989 ◽  
Vol 25 (15) ◽  
pp. 954 ◽  
Author(s):  
T. Matsui ◽  
H. Sugimoto ◽  
K. Ohtsuka ◽  
Y. Abe ◽  
H. Ogata
Keyword(s):  
Mass Transport ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Monolithically Integrated
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