A Wet Etching Technique for Accurate Etching of GaAs / AlAs Distributed Bragg Reflectors

1995 ◽  
Vol 142 (7) ◽  
pp. 2386-2388 ◽  
Author(s):  
K. Bacher ◽  
J. S. Harris
Keyword(s):  
Wet Etching ◽  
Bragg Reflectors ◽  
Distributed Bragg Reflectors ◽  
Etching Technique

High reflectivity airgap distributed Bragg reflectors realized by wet etching of AlInN sacrificial layers

2009 ◽  
Vol 95 (19) ◽  
pp. 191102 ◽  
Author(s):  
Alexei Altoukhov ◽  
Jacques Levrat ◽  
Eric Feltin ◽  
Jean-François Carlin ◽  
Antonino Castiglia ◽  
...  
Keyword(s):  
Wet Etching ◽  
Bragg Reflectors ◽  
Distributed Bragg Reflectors ◽  
High Reflectivity ◽  
Sacrificial Layers

Highly Reflective GaN-Based Air-Gap Distributed Bragg Reflectors Fabricated Using AlInN Wet Etching

2009 ◽  
Vol 2 (12) ◽  
pp. 121003 ◽  
Author(s):  
Mathieu Bellanger ◽  
Valérie Bousquet ◽  
Gabriel Christmann ◽  
Jeremy Baumberg ◽  
Matthias Kauer
Keyword(s):  
Air Gap ◽  
Wet Etching ◽  
Bragg Reflectors ◽  
Distributed Bragg Reflectors

scholarly journals Distributed Bragg reflectors from colloidal trilayer flake solutions

APL Photonics ◽  
2021 ◽  
Vol 6 (2) ◽  
pp. 026104
Author(s):  
Mirela Malekovic ◽  
Esteban Bermúdez-Ureña ◽  
Ullrich Steiner ◽  
Bodo D. Wilts
Keyword(s):  
Bragg Reflectors ◽  
Distributed Bragg Reflectors

Highly Sensitive Optical Modulators with Distributed Bragg-Reflectors

1977 ◽  
Vol 16 (8) ◽  
pp. 1389-1394 ◽  
Author(s):  
Masahiro Okuda ◽  
Kiyoshi Onaka ◽  
Shigeharu Kita
Keyword(s):  
Bragg Reflectors ◽  
Distributed Bragg Reflectors ◽  
Optical Modulators ◽  
Highly Sensitive

A high-quality factor hybrid plasmonic nanocavity based on distributed Bragg reflectors

2016 ◽  
Vol 25 (9) ◽  
pp. 097302
Author(s):  
Linlin Tu ◽  
Chi Zhang ◽  
Zhong Huang ◽  
Jason Yau ◽  
Peng Zhan ◽  
...  
Keyword(s):  
Quality Factor ◽  
High Quality Factor ◽  
Bragg Reflectors ◽  
Distributed Bragg Reflectors ◽  
High Quality

Study on the Manufacture of Microfluidic Chip with Coated Glass

2012 ◽  
Vol 548 ◽  
pp. 254-257 ◽  
Author(s):  
Yan He ◽  
Bai Ling Huang ◽  
Yong Lai Zhang ◽  
Li Gang Niu
Keyword(s):  
Microfluidic Chip ◽  
Low Cost ◽  
Microfluidic Channel ◽  
Critical Factor ◽  
Wet Etching ◽  
Microfluidic Chips ◽  
Etching Technique ◽  
Chip Quality ◽  
Wet Chemical ◽  
Wet Chemical Etching

In this paper, a simple and facile technique for manufacturing glass-based microfluidic chips was developed. Instead of using expensive dry etching technology, the standard UV lithography and wet chemical etching technique was used to fabricate microchannels on a K9 glass substrate. The fabrication process of microfluidic chip including vacuum evaporation, annealing, lithography, and BHF (HF-NH4F-H2O) wet etching were investigated. Through series experiments, we found that anneal was the critical factor for chip quality. As a representative example, a microfluidic channel with 20 m of depth, and 80 m of width was successfully prepared, and the channel surfaces are quite smooth. These results present a simple, low cost, flexible and easy way to fabricate glass-based microfluidic chips.

Fabrication of three dimensional porous silicon distributed Bragg reflectors

2008 ◽  
Vol 93 (22) ◽  
pp. 221905 ◽  
Author(s):  
D. Mangaiyarkarasi ◽  
M. B. H. Breese ◽  
Y. S. Ow
Keyword(s):  
Porous Silicon ◽  
Three Dimensional ◽  
Bragg Reflectors ◽  
Distributed Bragg Reflectors
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