Plasma‐Enhanced Chemical Vapor Deposition of Silicon Dioxide Deposited at Low Temperatures

1995 ◽  
Vol 142 (6) ◽  
pp. 2067-2071 ◽  
Author(s):  
M. F. Ceiler ◽  
P. A. Kohl ◽  
S. A. Bidstrup
Keyword(s):  
Chemical Vapor Deposition ◽  
Silicon Dioxide ◽  
Vapor Deposition ◽  
Low Temperatures ◽  
Chemical Vapor

Low-pressure chemical vapor deposition of silicon dioxide using diethylsilane

1993 ◽  
Vol 5 (12) ◽  
pp. 1710-1714 ◽  
Author(s):  
R. A. Levy ◽  
J. M. Grow ◽  
G. S. Chakravarthy
Keyword(s):  
Chemical Vapor Deposition ◽  
Silicon Dioxide ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical

Preparation of Epitaxial MgB2 Thick Films at Low Temperatures by Using Hybrid Physical-Chemical Vapor Deposition

2007 ◽  
Vol 51 (5) ◽  
pp. 1743-1747 ◽  
Author(s):  
J. Y. Huh ◽  
W. K. Seong ◽  
T. G. Lee ◽  
W. N. Kang ◽  
N. K. Yang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Low Temperatures ◽  
Thick Films ◽  
Chemical Vapor ◽  
Physical Chemical
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