Gravitational Stress‐Induced Dislocations in Large‐Diameter Silicon Wafers Studied by X‐Ray Topography and Computer Simulation

1998 ◽  
Vol 145 (7) ◽  
pp. 2523-2529 ◽  
Author(s):  
Hirofumi Shimizu ◽  
Seiichi Isomae ◽  
Kyoko Minowa ◽  
Tomomi Satoh ◽  
Tadashi Suzuki
Keyword(s):  
Computer Simulation ◽  
Large Diameter ◽  
Silicon Wafers ◽  
X Ray ◽  
Gravitational Stress

Diffuse x-ray scattering study of the formation of microdefects in heat-treated dislocation-free large-diameter silicon wafers

2003 ◽  
Vol 45 (10) ◽  
pp. 1918-1925 ◽  
Author(s):  
V. T. Bublik ◽  
S. Yu. Matsnev ◽  
K. D. Shcherbachev ◽  
M. V. Mezhennyi ◽  
M. G. Mil’vidskii ◽  
...  
Keyword(s):  
Large Diameter ◽  
Silicon Wafers ◽  
X Ray ◽  
X Ray Scattering ◽  
Heat Treated ◽  
Scattering Study ◽  
Ray Scattering

Synchrotron-radiation X-ray topography of surface strain in large-diameter silicon wafers

2002 ◽  
Vol 9 (3) ◽  
pp. 166-168 ◽  
Author(s):  
S. Kawado ◽  
S. Iida ◽  
S. Yamaguchi ◽  
S. Kimura ◽  
Y. Hirose ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Large Diameter ◽  
Silicon Wafers ◽  
Surface Strain ◽  
X Ray

scholarly journals The Rainwater Memorial Calibration Facility for X-Ray Optics

2011 ◽  
Vol 2011 ◽  
pp. 1-9 ◽  
Author(s):  
Nicolai F. Brejnholt ◽  
Finn E. Christensen ◽  
Charles J. Hailey ◽  
Nicolas M. Barrière ◽  
William W. Craig ◽  
...  
Keyword(s):  
Energy Range ◽  
Large Diameter ◽  
Silicon Wafers ◽  
Telescope Array ◽  
X Ray ◽  
Explorer Mission ◽  
Source Distance ◽  
Distance Effects ◽  
Calibration Facility ◽  
Ground Calibration

The Nuclear Spectroscopic Telescope ARray (NuSTAR) is a NASA Small Explorer mission that will carry the first focusing hard X-ray (5–80 keV) telescope to orbit. The ground calibration of the optics posed a challenge as the need to suppress finite source distance effects over the full optic and the energy range of interest were unique requirements not met by any existing facility. In this paper we present the requirements for the NuSTAR optics ground calibration, and how the Rainwater Memorial Calibration Facility, RaMCaF, is designed to meet the calibration requirements. The nearly 175 m long beamline sports a 48 cm diameter 5–100 keV X-ray beam and is capable of carrying out detailed studies of large diameter optic elements, such as the NuSTAR optics, as well as flat multilayer-coated Silicon wafers.

Arsenic segregation in polysilicon

1983 ◽  
Vol 41 ◽  
pp. 154-155 ◽  
Author(s):  
P.E. Batson ◽  
C.R.M. Grovenor ◽  
D.A. Smith ◽  
C. Wong
Keyword(s):  
Incident Beam ◽  
Silicon Wafers ◽  
Chemical Polishing ◽  
Bright Field Image ◽  
Beam Size ◽  
Stem Analysis ◽  
Bright Field ◽  
Twin Boundaries ◽  
X Ray ◽  
Line Scan

In this work As doped polysilicon was deposited onto (100) silicon wafers by APCVD at 660°C from a silane-arsine mixture, followed by a ten minute anneal at 1000°C, and in one case a further ten minute anneal at 700°C. Specimens for TEM and STEM analysis were prepared by chemical polishing. The microstructure, which is unchanged by the final 700°C anneal,is shown in Figure 1. It consists of numerous randomly oriented grains many of which contain twins.X-ray analysis was carried out in a VG HB5 STEM. As K α x-ray counts were collected from STEM scans across grain and twin boundaries, Figures 2-4. The incident beam size was about 1.5nm in diameter, and each of the 20 channels in the plots was sampled from a 1.6nm length of the approximately 30nm line scan across the boundary. The bright field image profile along the scanned line was monitored during the analysis to allow correlation between the image and the x-ray signal.

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