Dielectric Properties of Radio Frequency Magnetron Sputter Deposited Zirconium Titanate‐Based Thin Films

E. S. Ramakrishnan; Kenneth D. Cornett; Gary H. Shapiro; Wei‐Yean Howng

doi:10.1149/1.1838260

Dielectric Properties of Radio Frequency Magnetron Sputter Deposited Zirconium Titanate‐Based Thin Films

Journal of The Electrochemical Society ◽

10.1149/1.1838260 ◽

1998 ◽

Vol 145 (1) ◽

pp. 358-362 ◽

Cited By ~ 29

Author(s):

E. S. Ramakrishnan ◽

Kenneth D. Cornett ◽

Gary H. Shapiro ◽

Wei‐Yean Howng

Keyword(s):

Thin Films ◽

Dielectric Properties ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Zirconium Titanate ◽

Magnetron Sputter ◽

Sputter Deposited

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Growth and characterization of radio frequency magnetron sputter-deposited zinc stannate, Zn2SnO4, thin films

Journal of Applied Physics ◽

10.1063/1.1483104 ◽

2002 ◽

Vol 92 (1) ◽

pp. 310-319 ◽

Cited By ~ 167

Author(s):

David L. Young ◽

Helio Moutinho ◽

Yanfa Yan ◽

Timothy J. Coutts

Keyword(s):

Thin Films ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Zinc Stannate ◽

Magnetron Sputter ◽

Sputter Deposited

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Phase development of radio-frequency magnetron sputter-deposited Pb(Mg1/3Nb2/3)O3–PbTiO3 (90/10) thin films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582402 ◽

2000 ◽

Vol 18 (4) ◽

pp. 1659-1662 ◽

Cited By ~ 8

Author(s):

Jeon-Kook Lee ◽

Dongkyun Park ◽

Deok-Soo Cheong ◽

Jong-Wan Park ◽

Chul Soon Park

Keyword(s):

Thin Films ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Phase Development ◽

Magnetron Sputter ◽

Sputter Deposited

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Stoichiometry and phase purity control of radio frequency magnetron sputter deposited Ba0.45Sr0.55TiO3 thin films for tunable devices

Journal of Applied Physics ◽

10.1063/1.4829000 ◽

2013 ◽

Vol 114 (17) ◽

pp. 174104 ◽

Cited By ~ 8

Author(s):

Fikadu Alema ◽

Aaron Reinholz ◽

Konstantin Pokhodnya

Keyword(s):

Thin Films ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Phase Purity ◽

Magnetron Sputter ◽

Sputter Deposited ◽

Purity Control

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Microstructural characterization of radio frequency magnetron sputter-deposited Ga2O3:Mn phosphor thin films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1474418 ◽

2002 ◽

Vol 20 (3) ◽

pp. 928-933 ◽

Cited By ~ 10

Author(s):

Joo Han Kim ◽

Paul H. Holloway

Keyword(s):

Thin Films ◽

Radio Frequency ◽

Microstructural Characterization ◽

Radio Frequency Magnetron ◽

Magnetron Sputter ◽

Sputter Deposited

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Electrochromic properties of radio frequency magnetron sputter deposited mixed Nb2O5:MoO3 (95:5) thin films cycled in H+ and Li+ ions

Materials Science in Semiconductor Processing ◽

10.1016/j.mssp.2014.09.043 ◽

2015 ◽

Vol 30 ◽

pp. 31-40 ◽

Cited By ~ 19

Author(s):

N. Usha ◽

R. Sivakumar ◽

C. Sanjeeviraja

Keyword(s):

Thin Films ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Electrochromic Properties ◽

Magnetron Sputter ◽

Sputter Deposited

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Temperature dependence of SiO2/Si interfacial structure formed by radio-frequency magnetron sputter deposited SiO2 thin films on Si(111)

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581617 ◽

1999 ◽

Vol 17 (2) ◽

pp. 552-554 ◽

Cited By ~ 11

Author(s):

Boquan Li ◽

Toshiyuki Fujimoto ◽

Isao Kojima

Keyword(s):

Thin Films ◽

Radio Frequency ◽

Temperature Dependence ◽

Radio Frequency Magnetron ◽

Interfacial Structure ◽

Magnetron Sputter ◽

Sputter Deposited

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Comparative study of the radio-frequency magnetron sputter deposited CaP films fabricated onto acid-etched or pulsed electron beam-treated titanium

Thin Solid Films ◽

10.1016/j.tsf.2014.10.049 ◽

2014 ◽

Vol 571 ◽

pp. 218-224 ◽

Cited By ~ 27

Author(s):

M.A. Surmeneva ◽

R.A. Surmenev ◽

A.I. Tyurin ◽

T.M. Mukhametkaliyev ◽

A.D. Teresov ◽

...

Keyword(s):

Electron Beam ◽

Comparative Study ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Pulsed Electron Beam ◽

Magnetron Sputter ◽

Sputter Deposited

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Surface characterisation of the evolving nature of radio frequency (RF) magnetron sputter deposited calcium phosphate thin films after exposure to physiological solution

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2005.09.032 ◽

2006 ◽

Vol 200 (20-21) ◽

pp. 6002-6013 ◽

Cited By ~ 66

Author(s):

A.R. Boyd ◽

B.J. Meenan ◽

N.S. Leyland

Keyword(s):

Thin Films ◽

Calcium Phosphate ◽

Radio Frequency ◽

Physiological Solution ◽

Surface Characterisation ◽

Rf Magnetron Sputter ◽

Magnetron Sputter ◽

Sputter Deposited

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Effect of deposition parameters on the growth rate and dielectric properties of the Ba(SnxTi1−x)O3 thin films prepared by radio frequency magnetron sputtering

Journal of the European Ceramic Society ◽

10.1016/j.jeurceramsoc.2005.09.109 ◽

2006 ◽

Vol 26 (15) ◽

pp. 3211-3219 ◽

Cited By ~ 22

Author(s):

Hong-Hsin Huang ◽

Moo-Chin Wang ◽

Chung-Yuan Chen ◽

Nan-Chung Wu ◽

Huey-Jiuan Lin

Keyword(s):

Thin Films ◽

Growth Rate ◽

Dielectric Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Deposition Parameters

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Composition control and dielectric properties of bismuth zinc niobate thin films synthesized by radio-frequency magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1603280 ◽

2003 ◽

Vol 21 (5) ◽

pp. 1745-1751 ◽

Cited By ~ 37

Author(s):

Jiwei Lu ◽

Zhiqiang Chen ◽

Troy R. Taylor ◽

Susanne Stemmer

Keyword(s):

Thin Films ◽

Dielectric Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Composition Control ◽

Bismuth Zinc Niobate

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