Characterization of Anodic Films on Aluminum Formed in Carboxylate‐Based Nonaqueous Electrolyte Solutions

1997 ◽  
Vol 144 (11) ◽  
pp. 3743-3748 ◽  
Author(s):  
Makoto Ue ◽  
Fumikazu Mizutani ◽  
Sachie Takeuchi ◽  
Nariaki Sato
Keyword(s):  
Electrolyte Solutions ◽  
Anodic Films ◽  
Nonaqueous Electrolyte ◽  
Nonaqueous Electrolyte Solutions

Electrical Properties of Novel Anodic Films Formed in Nonaqueous Electrolyte Solutions

1997 ◽  
Vol 500 ◽  
Author(s):  
F. Mizutani ◽  
S. Takeuchi ◽  
T. Nishiwaki ◽  
N. Sato ◽  
M. Ue
Keyword(s):  
Electrical Properties ◽  
Thin Film Transistor ◽  
Electrolyte Solutions ◽  
Liquid Crystal Displays ◽  
Gate Insulator ◽  
Anodic Films ◽  
Nonaqueous Solutions ◽  
Nonaqueous Electrolyte ◽  
Metal Insulator Metal ◽  
Nonaqueous Electrolyte Solutions

ABSTRACTAn aluminum alloy (Al - 1.0% Si - 0.5% Cu) was anodized in nonaqueous electrolyte solutions containing propylene carbonate (PC), ethylene glycol (EG), or γ-butyrolactone (GBL) as a solvent. MIM (metal-insulator-metal) elements using these anodic films were made to evaluate their electrical properties. Leakage current of the anodic films formed in the nonaqueous solutions was lower than those formed in aqueous electrolyte solutions. These novel films are useful as a high insulating film used for a gate insulator in thin film transistor liquid crystal displays (TFT-LCD).

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