The Effect of Multilayer Patterns on Temperature Uniformity during Rapid Thermal Processing

1996 ◽  
Vol 143 (3) ◽  
pp. 1142-1151 ◽  
Author(s):  
Jeffrey P. Hebb ◽  
Klavs F. Jensen
Keyword(s):  
Thermal Processing ◽  
Rapid Thermal Processing ◽  
Temperature Uniformity

Monte Carlo Thermal Model of an Integrating Light Pipe for Rapid Thermal Processing

1996 ◽  
Vol 429 ◽  
Author(s):  
J. C. Thomas ◽  
D. P. Dewitt
Keyword(s):  
Monte Carlo ◽  
Thermal Processing ◽  
Monte Carlo Model ◽  
Rapid Thermal Processing ◽  
Width Ratio ◽  
Temperature Uniformity ◽  
System Parameters ◽  
Light Pipe ◽  
End Wall ◽  
Cavity Width

AbstractA Monte Carlo model is developed to simulate transient wafer heating as a function of system parameters in a kaleidoscope- or integrating light-pipe type cavity with square cross-section. Trends in wafer temperature uniformity are examined as a function of length-to-width ratio, cavity width, and the number of heating lamps. The effect on temperature determination by a radiometer placed in the bottom end wall of the cavity is simulated.

Optimization of Process Parameter and Temperature Uniformity On Wafers For Rapid Thermal Processing

1995 ◽  
Vol 387 ◽  
Author(s):  
Andreas Tillmann
Keyword(s):  
Standard Deviation ◽  
Thermal Processing ◽  
Rapid Thermal Processing ◽  
Oxide Thickness ◽  
Simulation Software ◽  
Process Parameter ◽  
Parameter Distribution ◽  
Temperature Uniformity ◽  
New Strategy ◽  
The Impact

AbstractA new strategy based algorithm to optimize process parameter uniformity (e.g.sheet resistance, oxide thickness) and temperature uniformity on wafers in a commercially available Rapid Thermal Processing (RTP) system with independent lamp control is described. The computational algorithm uses an effective strategy to minimize the standard deviation of the considered parameter distribution. It is based on simulation software which is able to calculate the temperature and resulting parameter distribution on the wafer for a given lamp correction table. A cyclical variation of the correction values of all lamps is done while minimizing the standard deviation of the considered process parameter. After the input of experimentally obtained wafer maps the optimization can be done within a few minutes. This technique is an effective tool for the process engineer to use to quickly optimize the homogeneity of the RTP tool for particular process requirements. The methodology will be shown on the basis of three typical RTP applications (Rapid Thermal Oxidation, Titanium Silicidation and Implant Annealing). The impact of variations of correction values for single lamps on the resulting process uniformity for different applications will be discussed.

Simulation of Temperature Effects during Rapid Thermal Processing

1989 ◽  
Vol 146 ◽  
Author(s):  
R. Kakoschek ◽  
E. BuβMann
Keyword(s):  
Stationary State ◽  
Excellent Agreement ◽  
Thermal Processing ◽  
Temperature Effects ◽  
Rapid Thermal Processing ◽  
Nonuniform Heating ◽  
Temperature Uniformity ◽  
Nonuniform Illumination ◽  
Potential Sources ◽  
Wafer Edge

ABSTRACTA complete theory of wafer heating during rapid thermal processing (RTP) is presented. Excellent agreement with experimental results of two commercial RTP systems is obtained. The temperature uniformity is limited by radiation loss at the wafer edge in the stationary state and by nonuniform illumination of the wafer during ramp-up. Structures on wafers are also potential sources for nonuniform heating. Considerable dynamic temperature inhomogeneities during rap-up might limitfu ture applications of RTPe specially when wafer sizes become larger. Possible improvements are suggested regarding adequate process cycling, chip and equipment design.

Modelling of Temperature Distribution of Semiconductors During Rapid Thermal Processing

1994 ◽  
Vol 342 ◽  
Author(s):  
Andreas Tillmann
Keyword(s):  
Temperature Distribution ◽  
Material Property ◽  
Thermal Processing ◽  
Rapid Thermal Processing ◽  
Two Dimensional ◽  
Temperature Uniformity ◽  
Temperature Dependent ◽  
Incident Intensity ◽  
Circular Test ◽  
Contour Plots

ABSTRACTThe modelling of temperature distribution on semiconductor wafers in common RTP-equipment is described. The incident intensity distribution on the wafer is calculated using raytracing. Based on this distribution the temperature distribution on the wafer is determined solving the two-dimensional heat conduction equation. If the dependence of a considered material property on the process temperature is known, the calculated temperature distribution can be convened to a distribution of this parameter.The distinctive feature of the described algorithms is the two-dimensional treatment of the distributions using a grid of ring segments, each with equal area. This grid is identical to the usual circular test patterns of multipoint measurement equipment. This is convenient since the evaluation of temperature uniformity in RTP equipment is done mostly by mapping an appropriate temperature dependent material property. All calculated distributions can be presented by contour plots as well as 3-D plots. This results in a very suitable method to compare simulated and experimental wafer maps.The agreement between simulated and experimental temperature distributions is shown.

Optimization of Process Parameter and Temperature Uniformity on Wafers for Rapid Thermal Processing

1995 ◽  
Vol 389 ◽  
Author(s):  
Andreas Tillmann
Keyword(s):  
Standard Deviation ◽  
Thermal Processing ◽  
Rapid Thermal Processing ◽  
Oxide Thickness ◽  
Simulation Software ◽  
Process Parameter ◽  
Parameter Distribution ◽  
Temperature Uniformity ◽  
New Strategy ◽  
The Impact

ABSTRACTA new strategy based algorithm to optimize process parameter uniformity (e.g. sheet resistance, oxide thickness) and temperature uniformity on wafers in a commercially available Rapid Thermal Processing (RTP) system with independent lamp control is described. The computational algorithm uses an effective strategy to minimize the standard deviation of the considered parameter distribution. It is based on simulation software which is able to calculate the temperature and resulting parameter distribution on the wafer for a given lamp correction table. A cyclical variation of the correction values of all lamps is done while minimizing the standard deviation of the considered process parameter. After the input of experimentally obtained wafer maps the optimization can be done within a few minutes. This technique is an effective tool for the process engineer to use to quickly optimize the homogeneity of the RTP tool for particular process requirements. The methodology will be shown on the basis of three typical RTP applications (Rapid Thermal Oxidation, Titanium Silicidation and Implant Annealing). The impact of variations of correction values for single lamps on the resulting process uniformity for different applications will be discussed.

The Control and Impact of Processing Ambient During RTP

1998 ◽  
Vol 514 ◽  
Author(s):  
Karen Maex ◽  
Eiichi Kondoh ◽  
Anne Lauwers ◽  
Muriel DePotter ◽  
Joris Prost
Keyword(s):  
Thermal Processing ◽  
Thermal Process ◽  
Rapid Thermal Processing ◽  
Process Window ◽  
Temperature Uniformity ◽  
Silicide Formation ◽  
Temperature Variations ◽  
Set Up ◽  
Interconnect Technology

ABSTRACTThe introduction of rapid thermal processing for silicide formation has triggered a lot of research to temperature uniformity and reproducibility in RTP systems. From the other side there has been the demand to make the process itself as robust as possible for temperature variations. Indeed the way the module is set up can open or close the thermal process window for silicidation. In addition to the temperature, the ambient control is to be taken into account. Although gasses are specified to a low level of contaminants, the RTP step needs to be optimized for optimal contaminant reduction. Besides, the process wafer itself can be a source of contamination. In this paper an overview will be given of the role of temperature and ambient during RTP on the silicidation processes. The effect of the wafer on ambient purity will be highlighted. It will be shown that the latter can also have an impact on other process steps in the interconnect technology.

Analysis of Critical Parameters Affecting the Temperature Uniformity During Rapid Thermal Processing

1994 ◽  
Vol 342 ◽  
Author(s):  
V. Nagabushnam ◽  
R.K. Sing ◽  
R.P.S. Thakur
Keyword(s):  
Energy Flux ◽  
Thermal Processing ◽  
Incident Energy ◽  
Rapid Thermal Processing ◽  
Open Loop ◽  
Physical Models ◽  
Critical Parameters ◽  
Temperature Uniformity ◽  
Doping Density ◽  
Free Ring

ABSTRACTIn this work we examine the effect of various system and wafer parameters such as the flowing ambient, the spatial distribution of incident energy flux, the slip-free ring and doping density on temperature non-uniformity occurring during rapid thermal processing (RTP). The effect of using two inert ambients, i.e. argon and nitrogen, on temperature non-uniformity occurring during RTP cycle is studied in detail. The importance of dynamic lamp power control in providing time dependent spatial variation of incident energy flux as a measure to improve the temperature uniformity is also examined. Finally the simulation studies are also done in the presence of a slip-free ring. The nature of photon capture by the silicon wafer and the correlation between doping density and the steady state temperature for any given open loop condition is discussed in detail. This analysis has been done using an analytical tool developed by us based on simple 3-dimensional physical models depicting a typical rapid thermal cycle[1].

The Potential Effect of Multilayer Patterns on Temperature Uniformity During Rapid Thermal Processing

1995 ◽  
Vol 387 ◽  
Author(s):  
Jeffrey P. Hebb ◽  
Klavs F. Jensen ◽  
Erik W. Egan
Keyword(s):  
Thermal Processing ◽  
Transport Model ◽  
Rapid Thermal Processing ◽  
Potential Effect ◽  
Electromagnetic Theory ◽  
Radiative Properties ◽  
Temperature Uniformity ◽  
Wafer Temperature ◽  
Single Side ◽  
Side Illumination

AbstractThis work aims to systematically gain an understanding of the effects of multilayer patterns on wafer temperature uniformity during rapid thermal processing, and explore possible solutions to the problem. Steady state and transient wafer temperature distributions are simulated by combining a detailed reactor transport model with multilayer electromagnetic theory to predict wafer radiative properties. A generic axisymmetric RTP system with single-side illumination is used as a testbed to explore pattern effects for a simulated source/drain implant anneal.

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