Epoxy Polymer Surface Roughness Modeling Based on Kinetic Studies of Wet Chemical Treatments

2004 ◽  
Vol 151 (8) ◽  
pp. J54 ◽  
Author(s):  
Sam Siau ◽  
Alfons Vervaet ◽  
Andre Van Calster ◽  
Ives Swennen ◽  
Etienne Schacht
Keyword(s):  
Surface Roughness ◽  
Epoxy Polymer ◽  
Polymer Surface ◽  
Kinetic Studies ◽  
Chemical Treatments ◽  
Wet Chemical

Kinetic Study of Wet Chemical Treatments on the Surface Roughness of Epoxy Polymer Layers for Buildup Layers

2004 ◽  
Vol 151 (12) ◽  
pp. C831 ◽  
Author(s):  
Sam Siau ◽  
Alfons Vervaet ◽  
Sylvie Nalines ◽  
Etienne Schacht ◽  
Andre Van Calster
Keyword(s):  
Surface Roughness ◽  
Kinetic Study ◽  
Epoxy Polymer ◽  
Polymer Layers ◽  
Chemical Treatments ◽  
Wet Chemical

Kinetic Study of Wet Chemical Treatments on the Surface Roughness of Epoxy Polymer Layers for Buildup Layers

2004 ◽  
Vol 151 (12) ◽  
pp. C816 ◽  
Author(s):  
Sam Siau ◽  
Alfons Vervaet ◽  
Sylvie Nalines ◽  
Etienne Schacht ◽  
Andre Van Calster
Keyword(s):  
Surface Roughness ◽  
Kinetic Study ◽  
Epoxy Polymer ◽  
Polymer Layers ◽  
Chemical Treatments ◽  
Wet Chemical

Influence of wet chemical treatments on the evolution of epoxy polymer layer surface roughness for use as a build-up layer

2004 ◽  
Vol 237 (1-4) ◽  
pp. 457-462 ◽  
Author(s):  
Sam Siau ◽  
Alfons Vervaet ◽  
Andre Van Calster ◽  
Ives Swennen ◽  
Etienne Schacht
Keyword(s):  
Surface Roughness ◽  
Epoxy Polymer ◽  
Polymer Layer ◽  
Layer Surface ◽  
Chemical Treatments ◽  
Wet Chemical

Control of Surface Roughness on Ge by Wet Chemical Treatments and Its Effects on Electron Mobility in n-FETs

2011 ◽  
Author(s):  
C. H. Lee ◽  
T. Nishimura ◽  
T. Tabata ◽  
M. Yoshida ◽  
K. Nagashio ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Electron Mobility ◽  
Chemical Treatments ◽  
Wet Chemical

Improvement of dry etch-induced surface roughness of single crystalline β-Ga2O3 using post-wet chemical treatments

2020 ◽  
Vol 506 ◽  
pp. 144673 ◽  
Author(s):  
Hoon-Ki Lee ◽  
Hyung-Joong Yun ◽  
Kyu-Hwan Shim ◽  
Hyun-Gwon Park ◽  
Tae-Hoon Jang ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Single Crystalline ◽  
Chemical Treatments ◽  
Wet Chemical ◽  
Dry Etch

Epoxy polymer surface modification through wet-chemical organic surface synthesis for adhesion improvement in microelectronics

2006 ◽  
Vol 495 (1-2) ◽  
pp. 348-356 ◽  
Author(s):  
Sam Siau ◽  
Alfons Vervaet ◽  
Etienne Schacht ◽  
Ulric Demeter ◽  
Andre Van Calster
Keyword(s):  
Surface Modification ◽  
Epoxy Polymer ◽  
Polymer Surface ◽  
Polymer Surface Modification ◽  
Wet Chemical

Roughness measurements of nonlinear optical polymer films by scanning tunneling microscopy

1989 ◽  
Vol 47 ◽  
pp. 22-23
Author(s):  
I. H. Musselman ◽  
R.-T. Chen ◽  
P. E. Russell
Keyword(s):  
Surface Roughness ◽  
Scanning Tunneling Microscopy ◽  
Nonlinear Optical ◽  
Polymer Surface ◽  
Light Extinction ◽  
Scanning Tunneling ◽  
Silicon Substrates ◽  
Tunneling Microscopy ◽  
Optical Polymer ◽  
Total Light

Scanning tunneling microscopy (STM) has been used to characterize the surface roughness of nonlinear optical (NLO) polymers. A review of STM of polymer surfaces is included in this volume. The NLO polymers are instrumental in the development of electrooptical waveguide devices, the most fundamental of which is the modulator. The most common modulator design is the Mach Zehnder interferometer, in which the input light is split into two legs and then recombined into a common output within the two dimensional waveguide. A π phase retardation, resulting in total light extinction at the output of the interferometer, can be achieved by changing the refractive index of one leg with respect to the other using the electrooptic effect. For best device performance, it is essential that the NLO polymer exhibit minimal surface roughness in order to reduce light scattering. Scanning tunneling microscopy, with its high lateral and vertical resolution, is capable of quantifying the NLO polymer surface roughness induced by processing. Results are presented below in which STM was used to measure the surface roughness of films produced by spin-coating NLO-active polymers onto silicon substrates.

Chemical Structures of Native Oxides Formed During Wet Chemical Treatments on NH4F Treated Si(111) Surfaces

1992 ◽  
Vol 259 ◽  
Author(s):  
Takeo Hattori ◽  
Hiroki Ogawa
Keyword(s):  
Photoelectron Spectroscopy ◽  
Attenuated Total Reflection ◽  
Native Oxide ◽  
X Ray ◽  
Chemical Treatments ◽  
Chemical Structures ◽  
Native Oxides ◽  
Ft Ir ◽  
Wet Chemical ◽  
Silicon Interface

ABSTRACTChemical structures of native oxides formed during wet chemical treatments on NH4F treated Si(111) surfaces were investigated using X-ray Photoelectron Spectroscopy (XPS) and Fourier Transformed Infrared Attenuated Total Reflection(FT-IR-ATR). It was found that the amounts of Si-H bonds in native oxides and those at native oxide/silicon interface are negligibly small in the case of native oxides formed in H2SO4-H2O2-H2O solution. Based on this discovery, it was confirmed that native oxides can be characterized by the amount of Si-H bonds in native oxides. Furthermore, it was found that the combination of various wet chemical treatments with the treatment in NH4OH-H2O2-H2O solution results in the drastic decrease in the amount of Si-H bonds in native oxides.

Wet chemical treatments of high purity Ge crystals for γ-ray detectors: Surface structure, passivation capabilities and air stability

2015 ◽  
Vol 161 ◽  
pp. 116-122 ◽  
Author(s):  
S. Carturan ◽  
G. Maggioni ◽  
S.J. Rezvani ◽  
R. Gunnella ◽  
N. Pinto ◽  
...  
Keyword(s):  
Surface Structure ◽  
High Purity ◽  
Chemical Treatments ◽  
Wet Chemical ◽  
Γ Ray

scholarly journals Study on the Physical Properties of a SiNW Biosensor to the Sensitivity of DNA Detection

Materials ◽  
2021 ◽  
Vol 14 (19) ◽  
pp. 5716
Author(s):  
Siti Noorhaniah Yusoh ◽  
Khatijah Aisha Yaacob
Keyword(s):  
Surface Roughness ◽  
Physical Properties ◽  
Limit Of Detection ◽  
Silicon Nanowire ◽  
Volume Ratio ◽  
Silicon Nanowire Arrays ◽  
Atomic Force ◽  
Local Anodic Oxidation ◽  
Wet Chemical ◽  
Biosensor Device

SiNW (silicon nanowire) arrays consisting of 5- and 10-wires were fabricated by using an atomic force microscope—the local anodic oxidation (AFM-LAO) technique followed by wet chemical etching. Tetramethylammonium hydroxide (TMAH) and isopropyl alcohol (IPA) at various concentrations were used to etch SiNWs. The SiNWs produced were differed in dimension and surface roughness. The SiNWs were functionalized and used for the detection of deoxyribonucleic acid (DNA) dengue (DEN-1). SiNW-based biosensors show sensitive detection of dengue DNA due to certain factors. The physical properties of SiNWs, such as the number of wires, the dimensions of wires, and surface roughness, were found to influence the sensitivity of the biosensor device. The SiNW biosensor device with 10 wires, a larger surface-to-volume ratio, and a rough surface is the most sensitive device, with a 1.93 fM limit of detection (LOD).

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