Fabry-Perot Type Antireflective Coatings for Binary Mask Applications in ArF and F[sub 2] Excimer Laser Lithographies

2003 ◽  
Vol 6 (4) ◽  
pp. G59
Author(s):  
H. L. Chen ◽  
C. C. Lee ◽  
Y. F. Chuang ◽  
M. C. Liu ◽  
C. I. Hsieh ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Binary Mask ◽  
Antireflective Coatings ◽  
Fabry Perot

Spectral-narrowing techniques for excimer laser oscillators

1985 ◽  
Vol 63 (2) ◽  
pp. 214-219 ◽  
Author(s):  
Terrence J. McKee
Keyword(s):  
Excimer Laser ◽  
Grazing Incidence ◽  
Broadband Noise ◽  
Spectral Narrowing ◽  
Fabry Perot ◽  
Laser Oscillators ◽  
Recent Developments ◽  
Overall Efficiency

Various techniques for use in spectral narrowing and tuning of excimer laser oscillators are described. Intracavity dispersive elements include Littrow grating, grazing-incidence grating, prisms, and Fabry–Perot etalons. Recent developments to improve overall efficiency and reduce broadband noise are outlined.

Low Alkaline Contamination Bilayer Bottom Antireflective Coatings in F[sub 2] Excimer Laser Lithography

2002 ◽  
Vol 5 (9) ◽  
pp. G89 ◽  
Author(s):  
H. L. Chen ◽  
Y. F. Chuang ◽  
C. C. Lee ◽  
F. H. Ko ◽  
C. I. Hsieh ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Antireflective Coatings ◽  
Laser Lithography

Microfiber Fabry-Perot sensors inscribed by 193nm excimer laser

2012 ◽  
Author(s):  
Jie Li ◽  
Xiang Shen ◽  
Li-Peng Sun ◽  
Bai-Ou Guan
Keyword(s):  
Excimer Laser ◽  
Fabry Perot

Temperature dependence of microhole-based fiber Fabry–Perot interferometric sensors fabricated by excimer laser

2018 ◽  
Vol 57 (05) ◽  
pp. 1 ◽  
Author(s):  
Yinggang Liu ◽  
Xin Liu ◽  
Haiwei Fu ◽  
Zhenan Jia ◽  
Ting Zhang
Keyword(s):  
Temperature Dependence ◽  
Excimer Laser ◽  
Interferometric Sensors ◽  
Fabry Perot

Excimer Laser Micromachining Using Binary Mask Projection for Large Area Patterning With Single Micrometer Features

2013 ◽  
Vol 1 (3) ◽  
Author(s):  
Govind Dayal ◽  
Syed Nadeem Akhtar ◽  
S. Anantha Ramakrishna ◽  
J. Ramkumar
Keyword(s):  
Excimer Laser ◽  
Material Removal ◽  
Removal Rate ◽  
Laser Micromachining ◽  
Binary Mask ◽  
Projection Technique ◽  
Large Area ◽  
Aspect Ratios ◽  
Simple Limit ◽  
Micrometer Scale

Excimer laser micromachining using binary mask projection has been investigated for rapid patterning of single micrometer features over large areas of various substrates. Simple limit for depth of focus that determines the depth to width aspect ratios is given and verified for different materials. Binary mask projection technique is found to conformally reproduce the mask features from the millimetre to the micrometer scale under proper focusing conditions. Large arrays of 1 μm and 15 μm holes on Kapton are made with high resolution and uniform periodicity. Material removal rate (MRR) for the laser machining of these holes are examined and the machining efficiency for these are found to have different dependence on the fluence. A saturation of hole-depth with increasing number of pulses is obtained.

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