Electrochemical and In Situ Optical Characterization of Single Micrometer-Size Particles of Spherical Nickel Oxide in Alkaline Aqueous Electrolytes

2003 ◽  
Vol 6 (4) ◽  
pp. E1 ◽  
Author(s):  
Attila Palencsár ◽  
Daniel A. Scherson
Keyword(s):  
Nickel Oxide ◽  
Optical Characterization ◽  
Aqueous Electrolytes ◽  
Micrometer Size

In situ optical characterization of LaAlO 3 epitaxy on SrTiO 3 (001)

2015 ◽  
Vol 109 (3) ◽  
pp. 37006 ◽  
Author(s):  
X. D. Zhu ◽  
Sebastian Wicklein ◽  
Felix Gunkel ◽  
Rui Xiao ◽  
Regina Dittmann
Keyword(s):  
Optical Characterization

Optical Characterization Of Industrially Sputtered Nickel–Nickel Oxide Solar Selective Surface

Solar Energy ◽  
2000 ◽  
Vol 68 (4) ◽  
pp. 325-328 ◽  
Author(s):  
M Adsten ◽  
R Joerger ◽  
K Järrendahl ◽  
E Wäckelgård
Keyword(s):  
Nickel Oxide ◽  
Optical Characterization

Optical characterization of transparent nickel oxide films deposited by DC current reactive sputtering

2011 ◽  
Vol 519 (17) ◽  
pp. 5767-5770 ◽  
Author(s):  
A. Karpinski ◽  
N. Ouldhamadouche ◽  
A. Ferrec ◽  
L. Cattin ◽  
M. Richard-Plouet ◽  
...  
Keyword(s):  
Nickel Oxide ◽  
Oxide Films ◽  
Reactive Sputtering ◽  
Optical Characterization ◽  
Dc Current ◽  
Nickel Oxide Films

scholarly journals In situ and ex situ optical characterization of electro deposited magneto-optic materials

1996 ◽  
Vol 79 (8) ◽  
pp. 6193 ◽  
Author(s):  
James N. Hilfiker ◽  
Darin W. Glenn ◽  
Scott Heckens ◽  
John A. Woollam ◽  
Kurt W. Wierman
Keyword(s):  
Optical Characterization ◽  
Ex Situ ◽  
Magneto Optic

In situ optical characterization of GaAs and InP surfaces during chloride atomic layer epitaxy

1993 ◽  
Vol 225 (1-2) ◽  
pp. 47-52 ◽  
Author(s):  
Kenichi Nishi ◽  
Akira Usui ◽  
Hiroyuki Sakaki
Keyword(s):  
Atomic Layer ◽  
Optical Characterization ◽  
Atomic Layer Epitaxy

Refractive Index Modification During Deposition of Silicon Oxynitride Films Prepared by Reactive Laser Ablation

1998 ◽  
Vol 526 ◽  
Author(s):  
R. Machorro ◽  
G. Soto ◽  
E. C. Samano ◽  
L. Cota-Araiza
Keyword(s):  
Refractive Index ◽  
Laser Ablation ◽  
Optical Filters ◽  
Optical Characterization ◽  
Silicon Oxynitride ◽  
Xps Characterization ◽  
High Oxidation ◽  
Oxygen Gas

AbstractInhomogeneous low-k thin films of SiOxNy have been deposited by laser ablation of a Si3N4 sintered target in presence of oxygen gas. The high oxidation rate of silicon nitride has been used to control the stoichiometry of the films by modifying the oxygen partial pressure. The refractive index of the deposited material was able to be tailored at any value between 1.47 (SiO2) to 2.03 (Si3N4) by this approach. In situ optical characterization of the growing films was possible using kinetic and spectro ellipsometry. The refractive index was determined by applying the Effective Medium Approximation (EMA) and considering a mixture of SiO2, Si3N4, and voids. The volumetric composition obtained by ellipsometry was compared to the results determined by AES and XPS characterization. The purpose of this application is to show that reactive PLD can be used to produce high quality optical filters.

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