In Situ Rapid Thermal Oxidation and Reduction of Copper Thin Films and Their Applications in Ultralarge Scale Integration

2001 ◽  
Vol 148 (12) ◽  
pp. G669 ◽  
Author(s):  
Yao Zhi Hu ◽  
Rahul Sharangpani ◽  
Sing-Pin Tay
Keyword(s):  
Thin Films ◽  
Thermal Oxidation ◽  
Rapid Thermal Oxidation ◽  
Scale Integration

In situ study of porous silicon thin films thermal oxidation by pulsed laser photoacoustics

2018 ◽  
Vol 33 (8) ◽  
pp. 085001
Author(s):  
Atzin David Ruíz Pérez ◽  
M B de la Mora ◽  
J L Benítez ◽  
R Castañeda-Guzmán ◽  
Jorge Alejandro Reyes-Esqueda ◽  
...  
Keyword(s):  
Thin Films ◽  
Porous Silicon ◽  
Thermal Oxidation ◽  
Pulsed Laser ◽  
In Situ Study ◽  
Silicon Thin Films

Oxidation kinetics of Si and SiGe by dry rapid thermal oxidation, in-situ steam generation oxidation and dry furnace oxidation

2017 ◽  
Vol 121 (24) ◽  
pp. 245308 ◽  
Author(s):  
Fabien Rozé ◽  
Olivier Gourhant ◽  
Elisabeth Blanquet ◽  
François Bertin ◽  
Marc Juhel ◽  
...  
Keyword(s):  
Thermal Oxidation ◽  
Oxidation Kinetics ◽  
Steam Generation ◽  
Rapid Thermal Oxidation ◽  
Kinetics Of

Pd/Ta2O5/SiC Schottky-diode hydrogen sensors formed by using rapid thermal oxidation of Ta thin films

2013 ◽  
Vol 63 (9) ◽  
pp. 1794-1798 ◽  
Author(s):  
Sung-Jae Joo ◽  
Je Hoon Choi ◽  
Seong Jeen Kim ◽  
Sang-Cheol Kim
Keyword(s):  
Thin Films ◽  
Thermal Oxidation ◽  
Schottky Diode ◽  
Hydrogen Sensors ◽  
Rapid Thermal Oxidation

Fabrication of Epitaxial Cu$_{2}$O (111) Films from Cu(111) thin Films by Rapid Thermal Oxidation

2020 ◽  
Vol 70 (11) ◽  
pp. 914-919
Author(s):  
Miyeon CHEON ◽  
Yousil LEE ◽  
Sujae KIM ◽  
Se Young jeong*
Keyword(s):  
Thin Films ◽  
Thermal Oxidation ◽  
Rapid Thermal Oxidation

A Comparison of In-Situ Vapor/Gas Phase Cleaning with Conventional RCA based Wet Cleaning

1994 ◽  
Vol 342 ◽  
Author(s):  
John M. Grant
Keyword(s):  
Thermal Oxidation ◽  
Gas Phase ◽  
Temperature Control ◽  
Organic Contaminants ◽  
Gate Dielectric ◽  
Interface Trap ◽  
Comparison Study ◽  
Rapid Thermal Oxidation

ABSTRACTA comparison study of the effectiveness of in-situ vapor/gas phase cleaning versus conventional wet RCA based cleaning has been performed. The effectiveness of the cleans were compared using Surface Photo-Voltage (SPV) measurements of the quality of a 70Å gate dielectric. Dielectrics grown in oxygen by Rapid Thermal Oxidation (RTO) were measured using SPV. The vapor/gas phase cleaning processes studied have three steps corresponding to the baths in a conventional RCA-based clean. A clean using O2 was used to clean the organic contaminants normally cleaned in the SC-1 bath, a C12 based step corresponded to the SC-2 solution, and an HF/alcohol etch was used to remove the oxide normally etched using buffered HF. It was seen that temperature control of the cleaning chamber walls is necessary to insure reproducible processes and reasonable pump down times. Measurements by SPV indicate that dielectrics grown after vapor-gas phase cleaning have lower interface trap densities than oxides grown after an RCA-based clean.

Rapid thermal oxidation of epitaxial SiGe thin films

2002 ◽  
Vol 89 (1-3) ◽  
pp. 269-273 ◽  
Author(s):  
A Terrasi ◽  
S Scalese ◽  
R Adorno ◽  
E Ferlito ◽  
M Spadafora ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Oxidation ◽  
Rapid Thermal Oxidation

Rapid thermal oxidation of radio frequency sputtered polycrystalline Si1−xGex thin films

2001 ◽  
Vol 45 (11) ◽  
pp. 1957-1961 ◽  
Author(s):  
A. Natarajan ◽  
L.K. Bera ◽  
W.K. Choi ◽  
T. Osipowicz ◽  
H.L. Seng
Keyword(s):  
Thin Films ◽  
Radio Frequency ◽  
Thermal Oxidation ◽  
Rapid Thermal Oxidation
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