Chemical Mechanical Polishing of Low Dielectric Constant Oxide Films Deposited Using Flowfill Chemical Vapor Deposition Technology

2000 ◽  
Vol 147 (10) ◽  
pp. 3816 ◽  
Author(s):  
Hao Cui ◽  
Ishwara B. Bhat ◽  
Shyam P. Murarka ◽  
Hongqiang Lu ◽  
Weidan Li ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Mechanical Polishing ◽  
Oxide Films ◽  
Chemical Vapor ◽  
Mechanical Polishing ◽  
Low Dielectric Constant ◽  
Low Dielectric ◽  
Deposition Technology

Preparation of low dielectric constant F‐doped SiO2 films by plasma enhanced chemical vapor deposition

1996 ◽  
Vol 68 (6) ◽  
pp. 832-834 ◽  
Author(s):  
Sang Woo Lim ◽  
Yukihiro Shimogaki ◽  
Yoshiaki Nakano ◽  
Kunio Tada ◽  
Hiroshi Komiyama
Keyword(s):  
Dielectric Constant ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Dielectric Constant ◽  
Sio2 Films ◽  
Low Dielectric
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