Structural Properties of Sn[sub x]S[sub y] Thin Films Prepared by Plasma-Enhanced Chemical Vapor Deposition

2000 ◽  
Vol 147 (10) ◽  
pp. 3708 ◽  
Author(s):  
A. Sanchez-Juarez ◽  
A. Ortiz
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Structural Properties ◽  
Vapor Deposition ◽  
Chemical Vapor

THE INFLUENCE OF METHANE GAS PRESSURE ON THE OPTICAL, ELECTRICAL AND STRUCTURAL PROPERTIES OF NITROGENATED AMORPHOUS CARBON FILMS GROWN BY SURFACE WAVE MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION

2004 ◽  
Vol 11 (06) ◽  
pp. 553-558 ◽  
Author(s):  
M. RUSOP ◽  
A. M. M. OMER ◽  
S. ADHIKARI ◽  
S. ADHIKARY ◽  
H. MOKUTANI ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Surface Wave ◽  
Structural Properties ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Gas Pressure ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition

The influence of methane gas ( CH 4) pressure on the optical, electrical and structural properties of the nitrogenated amorphous carbon nitride ( a - C : N ) films grown by microwave surface wave plasma chemical vapor deposition (SWP-CVD) on quartz and silicon (100) substrates have been studied. The a - C : N films are deposited with varying CH 4 gas ranging from 5 to 20 ml/min. To incorporate nitrogen in the film, we have introduced nitrogen gas ( N ) at 5 ml/min in the chamber. The effects of CH 4 gas pressure on the surface morphology, composition, structure, and electrical properties of the N -incorporated camphoric carbon thin films have been investigated using scanning electron microscopy (SEM), atomic force microscopy (AFM), Auger electron spectroscopy (AES), UV-visible spectroscopy and four-probe resistance measurement. We have succeed in growing a - C : N thin films using SWP-CVD at room temperature and found that the amorphous structure of a - C films can be changed and is strongly dependent on the CH 4 gas source.

High Band Gap Nanocrystalline Tungsten Carbide (nc-WC) Thin Films Grown by Hot Wire Chemical Vapor Deposition (HW-CVD) Method

2018 ◽  
Vol 10 (3) ◽  
pp. 03001-1-03001-6 ◽  
Author(s):  
Bharat Gabhale ◽  
◽  
Ashok Jadhawar ◽  
Ajinkya Bhorde ◽  
Shruthi Nair ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Tungsten Carbide ◽  
Band Gap ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Hot Wire ◽  
Cvd Method ◽  
High Band
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