Study of  NH 3 Plasma Damage on GaAs Schottky Diode in Inductively Coupled Plasma System

1999 ◽  
Vol 146 (7) ◽  
pp. 2717-2719 ◽  
Author(s):  
L. C. Meyer ◽  
J. W. Lee ◽  
D. Johnson ◽  
M. Huang ◽  
F. Ren ◽  
...  
Keyword(s):  
Schottky Diode ◽  
Inductively Coupled Plasma ◽  
Plasma System ◽  
Plasma Damage ◽  
Inductively Coupled

Diamond-like amorphous carbon layer film by an inductively coupled plasma system for next generation etching hard mask

2018 ◽  
Vol 663 ◽  
pp. 21-24 ◽  
Author(s):  
Se Jun Park ◽  
Dohyung Kim ◽  
Seungmoo Lee ◽  
Yongjoon Ha ◽  
Mingyoo Lim ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Inductively Coupled Plasma ◽  
Carbon Layer ◽  
Next Generation ◽  
Plasma System ◽  
Layer Film ◽  
Hard Mask ◽  
Inductively Coupled ◽  
Amorphous Carbon Layer

Low Inductance Antenna (LIA) plasma source and plasma-enhanced dual rotatable magnetron sputter assisted with LIA

2015 ◽  
Vol 2015 (1) ◽  
pp. 000757-000760
Author(s):  
Y. Takaya ◽  
Y. Tanioka ◽  
H. Yoshino ◽  
A. Osawa
Keyword(s):  
Inductively Coupled Plasma ◽  
Low Voltage ◽  
Polymer Surface ◽  
Plasma Source ◽  
Large Area ◽  
Plasma Damage ◽  
Inductively Coupled ◽  
Temperature Deposition ◽  
Magnetron Sputter ◽  
Plasma Profile

In recent years, both low plasma damage and low temperature deposition technic for polymer substrates (e.g. PCB, films and etc.) are often required. We have developed a plasma enhanced dual rotatable magnetron sputter source assisted with inductively coupled plasma (ICP) using low inductance antenna (LIA). LIA has same unique characteristics, a)low voltage high density plasma, b)well controllability of plasma profile to ensure uniformity over large area, c)ionization of sputtered particle and etc. when in being used as a plasma assistant, and besides, LIA can be used as a ICP source for polymer surface modification. We introduce a variety of the possibilities of whether this sputter source is usable for the process of the fabrication of PCB.

scholarly journals Drinking Water Treatment by Inductively Coupled Plasma System to Remove of Microorganisms in River Water

2018 ◽  
Vol 156 ◽  
pp. 03038 ◽  
Author(s):  
Reni Desmiarti ◽  
Ariadi Hazmi ◽  
Primas Emeraldi ◽  
Munas Martynis ◽  
Yenni Trianda ◽  
...  
Keyword(s):  
Drinking Water ◽  
Energy Consumption ◽  
Water Treatment ◽  
River Water ◽  
Removal Efficiency ◽  
Inductively Coupled Plasma ◽  
Death Rate ◽  
Drinking Water Treatment ◽  
Plasma System ◽  
Inductively Coupled

Inductively coupled plasma system was used in drinking water treatment system to kill the microorganisms in water such as total coliforms (TC), fecal coliforms (FC) and other coliforms (OC) from river water. The aim of this study was to investigate the effect of flowrate on removal efficiency (RE), death rate, and death yield and energy consumption of bacteria's. The frequency of the system was set at 4.6 MHz. The results show that the removal efficiencies and death rate of TC, FC and OC decreased with increasing flowrate. Compared to FC, the first-order reactions of TC and OC were lower in the following order: FC > OC > TC. The death yield of TC and OC significantly increased when the removal efficiency increased. The electromagnetic flux varied from 19.44 to 20.55 W/cm2 and the energy consumption was 0.26, 0.32, and 0.67 with flow rate at 20, 10 and 5 mL/minute, respectively. These results are very necessary to improve drinking water treatment.

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