Vanadyl Precursors Used to Modify the Properties of Vanadium Oxide Thin Films Obtained by Chemical Vapor Deposition

Davide Barreca; Laura E. Depero; Enrico Franzato; Gian Andrea Rizzi; Luigi Sangaletti; Eugenio Tondello; Umberto Vettori

doi:10.1149/1.1391642

Vanadyl Precursors Used to Modify the Properties of Vanadium Oxide Thin Films Obtained by Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1391642 ◽

1999 ◽

Vol 146 (2) ◽

pp. 551-558 ◽

Cited By ~ 49

Author(s):

Davide Barreca ◽

Laura E. Depero ◽

Enrico Franzato ◽

Gian Andrea Rizzi ◽

Luigi Sangaletti ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vanadium Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Vanadium Oxide Thin Films

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Two-dimensional recrystallisation processes of nanometric vanadium oxide thin films grown by atomic layer chemical vapor deposition (ALCVD) evidenced by AFM

Applied Surface Science ◽

10.1016/j.apsusc.2005.08.014 ◽

2006 ◽

Vol 252 (16) ◽

pp. 5917-5925 ◽

Cited By ~ 18

Author(s):

H. Groult ◽

E. Balnois ◽

A. Mantoux ◽

K. Le Van ◽

D. Lincot

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vanadium Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Atomic Layer ◽

Two Dimensional ◽

Oxide Thin Films ◽

Vanadium Oxide Thin Films

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Chemical Vapor Deposition of Vanadium Oxide Thin Films

Journal of The Electrochemical Society ◽

10.1149/1.2096771 ◽

1989 ◽

Vol 136 (3) ◽

pp. 897-898 ◽

Cited By ~ 3

Author(s):

K. L. Siefering ◽

G. L. Griffin

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vanadium Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Vanadium Oxide Thin Films

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The Quality Improvement of Yttrium Oxide Thin Films Grown at Low Temperature via the 3 rd Generation Mist Chemical Vapor Deposition Using Oxygen Supporting Sources

physica status solidi (b) ◽

10.1002/pssb.202100105 ◽

2021 ◽

Author(s):

Li Liu ◽

Toshiyuki Kawaharamura ◽

Masahito Sakamoto ◽

Misaki Nishi ◽

Giang T. Dang ◽

...

Keyword(s):

Thin Films ◽

Quality Improvement ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Yttrium Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films

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Electrical conduction in 10–20 nm thick polycrystalline tin oxide thin films deposited by chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2008.11.047 ◽

2009 ◽

Vol 517 (9) ◽

pp. 2953-2958 ◽

Cited By ~ 6

Author(s):

Yuji Matsui ◽

Yuichi Yamamoto

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Tin Oxide ◽

Electrical Conduction ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

20 Nm

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Study the Physical Properties Antimony Doped Zinc Oxide Thin Films Prepared by Chemical Vapor Deposition

Rafidain Journal of Science ◽

10.33899/rjs.2012.59641 ◽

2012 ◽

Vol 23 (6) ◽

pp. 163-179

Author(s):

Basil H. Nasir ◽

Mekhaiel I. Manssor

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Chemical Vapor Deposition ◽

Physical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films

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LOW PRESSURE CHEMICAL VAPOR DEPOSITION OF TIN OXIDE THIN FILMS FROM AN ORGANOMETALLIC COMPOUND. APPLICATION TO GAS DETECTION

Journal de Physique IV (Proceedings) ◽

10.1051/jp4:1991237 ◽

1991 ◽

Vol 02 (C2) ◽

pp. C2-303-C2-310 ◽

Cited By ~ 1

Author(s):

C. PIJOLAT ◽

L. BRUNO ◽

R. LALAUZE

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Tin Oxide ◽

Vapor Deposition ◽

Organometallic Compound ◽

Chemical Vapor ◽

Low Pressure ◽

Gas Detection ◽

Oxide Thin Films ◽

Pressure Chemical

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Growth of magnesium oxide thin films using single molecular precursors by metal–organic chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(98)01524-7 ◽

1999 ◽

Vol 341 (1-2) ◽

pp. 63-67 ◽

Cited By ~ 42

Author(s):

Jin-Hyo Boo ◽

Soon-Bo Lee ◽

Kyu-Sang Yu ◽

Wonyong Koh ◽

Yunsoo Kim

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Magnesium Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Oxide Thin Films ◽

Molecular Precursors ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Magnetic Field-Assisted Chemical Vapor Deposition of Iron Oxide Thin Films: Influence of Field–Matter Interactions on Phase Composition and Morphology

The Journal of Physical Chemistry Letters ◽

10.1021/acs.jpclett.9b02381 ◽

2019 ◽

Vol 10 (20) ◽

pp. 6253-6259 ◽

Cited By ~ 4

Author(s):

Daniel Stadler ◽

David N. Mueller ◽

Thomas Brede ◽

Tomáš Duchoň ◽

Thomas Fischer ◽

...

Keyword(s):

Magnetic Field ◽

Thin Films ◽

Phase Composition ◽

Chemical Vapor Deposition ◽

Iron Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films

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ChemInform Abstract: CHEMICAL VAPOR DEPOSITION OF ALUMINUM OXIDE THIN FILMS UNDER REDUCED PRESSURES

Chemischer Informationsdienst ◽

10.1002/chin.198530397 ◽

1985 ◽

Vol 16 (30) ◽

Author(s):

J. SARAIE ◽

J. KWON ◽

Y. YODOGAWA

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Reduced Pressures

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Indium‐tin oxide thin films prepared by chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.349189 ◽

1991 ◽

Vol 70 (7) ◽

pp. 3848-3851 ◽

Cited By ~ 115

Author(s):

Toshiro Maruyama ◽

Kunihiro Fukui

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films

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