(Invited) Enhancing the Blue Emission in Ce Doped Silicon Oxynitrides Thin Films for Electroluminescence Device Applications

2018 ◽  
Vol 85 (3) ◽  
pp. 9-21
Author(s):  
Florian Ehre ◽  
Christian Dufour ◽  
Oriol Blázquez ◽  
Blas Garrido ◽  
Wojciech Jadwisienczak ◽  
...  
2019 ◽  
Vol 8 (12) ◽  
pp. R157-R163
Author(s):  
F. Ehré ◽  
C. Dufour ◽  
O. Blázquez ◽  
B. Garrido ◽  
W. M. Jadwisienczak ◽  
...  

2016 ◽  
Vol 183 ◽  
pp. 191-196 ◽  
Author(s):  
Shubhra Mishra ◽  
D.S. Kshatri ◽  
Ayush Khare ◽  
Sanjay Tiwari ◽  
Prabhat K. Dwivedi

Author(s):  
Karren L. More

Beta-SiC is an ideal candidate material for use in semiconductor device applications. Currently, monocrystalline β-SiC thin films are epitaxially grown on {100} Si substrates by chemical vapor deposition (CVD). These films, however, contain a high density of defects such as stacking faults, microtwins, and antiphase boundaries (APBs) as a result of the 20% lattice mismatch across the growth interface and an 8% difference in thermal expansion coefficients between Si and SiC. An ideal substrate material for the growth of β-SiC is α-SiC. Unfortunately, high purity, bulk α-SiC single crystals are very difficult to grow. The major source of SiC suitable for use as a substrate material is the random growth of {0001} 6H α-SiC crystals in an Acheson furnace used to make SiC grit for abrasive applications. To prepare clean, atomically smooth surfaces, the substrates are oxidized at 1473 K in flowing 02 for 1.5 h which removes ∽50 nm of the as-grown surface. The natural {0001} surface can terminate as either a Si (0001) layer or as a C (0001) layer.


2016 ◽  
Vol 27 (8) ◽  
pp. 7809-7821 ◽  
Author(s):  
N. Usha ◽  
R. Sivakumar ◽  
C. Sanjeeviraja ◽  
R. Balasubramaniam ◽  
Y. Kuroki

2021 ◽  
Vol 50 (5) ◽  
pp. 2576-2583
Author(s):  
Uche Paul Onochie ◽  
Sunday Chukwuyem Ikpeseni ◽  
Anthony Egwu Igweoko ◽  
Hilary Ijeoma Owamah ◽  
Chinecherem Collins Aluma ◽  
...  

AIP Advances ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 025139
Author(s):  
Yanze Wu ◽  
I-Chen Yeng ◽  
Hongbin Yu

1997 ◽  
Vol 26 (10) ◽  
pp. 995-996 ◽  
Author(s):  
Isao Hasegawa ◽  
Koji Shibusa ◽  
Satoshi Kobayashi ◽  
Shuichi Nonomura ◽  
Shoji Nitta

2009 ◽  
Vol 498 (1) ◽  
pp. 193-202 ◽  
Author(s):  
Youngson Choe ◽  
Young-Rae Cho ◽  
Dosoon Kang ◽  
Wonho Kim ◽  
Dae-Won Park

Sign in / Sign up

Export Citation Format

Share Document