Wavefront Correction and Customization of Focal Spot of 100 TW Ti:Sapphire Laser System

2007 ◽  
Vol 46 (12) ◽  
pp. 7724-7730 ◽  
Author(s):  
Tae Moon Jeong ◽  
Il Woo Choi ◽  
Nasr Hafz ◽  
Jae Hee Sung ◽  
Seong Ku Lee ◽  
...  
Keyword(s):  
Focal Spot ◽  
Laser System ◽  
Wavefront Correction ◽  
Ti:Sapphire Laser

Generation of 1.2 X diffraction-limited focal spot from the 100 TW Ti:sapphire laser system

2007 ◽  
Author(s):  
Tae Moon Jeong ◽  
Il Woo Choi ◽  
Nasr Hafz ◽  
Jae Hee Sung ◽  
Do-Kyeong Ko ◽  
...  
Keyword(s):  
Focal Spot ◽  
Laser System ◽  
Ti:Sapphire Laser

Wavefront correction for near diffraction-limited focal spot on a 6×100 J/1-ns laser facility

2003 ◽  
Author(s):  
Julien Fuchs ◽  
Benoit F. Wattellier ◽  
Ji P. Zou ◽  
Jean-Christophe Chanteloup ◽  
H. Bandulet ◽  
...  
Keyword(s):  
Focal Spot ◽  
Wavefront Correction ◽  
Laser Facility

scholarly journals 1178 J, 527 nm near diffraction limited laser based on a complete closed-loop adaptive optics controlled off-axis multi-pass amplification laser system

2021 ◽  
Vol 9 ◽  
Author(s):  
Deen Wang ◽  
Xin Zhang ◽  
Wanjun Dai ◽  
Ying Yang ◽  
Xuewei Deng ◽  
...  
Keyword(s):  
Laser Beam ◽  
Adaptive Optics ◽  
Closed Loop ◽  
Focal Spot ◽  
Beam Quality ◽  
Laser System ◽  
Diffraction Limit ◽  
Kdp Crystal ◽  
Main Amplifier

Abstract A 1178 J near diffraction limited 527 nm laser is realized in a complete closed-loop adaptive optics (AO) controlled off-axis multi-pass amplification laser system. Generated from a fiber laser and amplified by the pre-amplifier and the main amplifier, a 1053 nm laser beam with the energy of 1900 J is obtained and converted into a 527 nm laser beam by a KDP crystal with 62% conversion efficiency, 1178 J and beam quality of 7.93 times the diffraction limit (DL). By using a complete closed-loop AO configuration, the static and dynamic wavefront distortions of the laser system are measured and compensated. After correction, the diameter of the circle enclosing 80% energy is improved remarkably from 7.93DL to 1.29DL. The focal spot is highly concentrated and the 1178 J, 527 nm near diffraction limited laser is achieved.

High-contrast, high-intensity laser pulse generation using a nonlinear preamplifier in a Ti:sapphire laser system

2008 ◽  
Vol 33 (7) ◽  
pp. 645 ◽  
Author(s):  
Hiromitsu Kiriyama ◽  
Michiaki Mori ◽  
Yoshiki Nakai ◽  
Takuya Shimomura ◽  
Manabu Tanoue ◽  
...  
Keyword(s):  
Laser Pulse ◽  
High Intensity ◽  
Laser System ◽  
Pulse Generation ◽  
High Contrast ◽  
Ti:Sapphire Laser ◽  
High Intensity Laser ◽  
Intensity Laser

5.4-TW/46-fs 10-Hz Ti:sapphire laser system

2000 ◽  
Vol 43 (5) ◽  
pp. 533-538 ◽  
Author(s):  
Zhizhan Xu ◽  
Xiaodong Yang ◽  
Luc Vigroux ◽  
Frederic Saviot ◽  
Jianping Zhou ◽  
...  
Keyword(s):  
Laser System ◽  
Ti:Sapphire Laser

Tissue perforation of vessel substitutes using a femtosecond Ti:sapphire laser system

2000 ◽  
Author(s):  
Volker Schmidt ◽  
Wolfgang Husinsky ◽  
R. Graf ◽  
F. Fitzal ◽  
M. Grabenwoeger
Keyword(s):  
Laser System ◽  
Ti:Sapphire Laser
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