Robust Ultrathin Oxynitride with High Nitrogen Diffusion Barrier near its Surface Formed by NH3Nitridation of Chemical Oxide and Reoxidation with O2

2006 ◽  
Vol 45 (6A) ◽  
pp. 4898-4902 ◽  
Author(s):  
Chiung Hui Lai ◽  
Bo Chun Lin ◽  
Kow Ming Chang ◽  
Kuang Yeu Hsieh ◽  
Yi Lung Lai
Keyword(s):  
Diffusion Barrier ◽  
Nitrogen Diffusion ◽  
High Nitrogen

Plasma Printing of Micronozzles With Complex Shaped Outlets Into Stainless Steel Sheets

2019 ◽  
Vol 7 (3) ◽  
Author(s):  
Tatsuhiko Aizawa ◽  
Kenji Wasa
Keyword(s):  
Stainless Steel ◽  
Stainless Steel Substrate ◽  
Steel Substrate ◽  
Substrate Surface ◽  
Maskless Lithography ◽  
Two Dimensional ◽  
Nitrogen Diffusion ◽  
High Nitrogen ◽  
Steel Sheets ◽  
Inner Diameter

Abstract The plasma printing was developed as a means to fabricate the micronozzle chip with the inner diameter less than 50 μm. The initial two-dimensional micropattern was printed onto the stainless steel substrate surface by the maskless lithography. These printed micropatterns were utilized as a mask to make selective nitriding into the unprinted surface. After removal of printed pattern, the un-nitrided surfaces were chemically etched to leave the nitrided microtexture as a micronozzle chip. High nitrogen supersaturation as well as selective nitrogen diffusion had influence on the spatial resolution in this plasma printing in addition to the digitizing error in the maskless lithography.

Study of Nitrogen Diffusion Profile of Low Resistivity Diffusion Barrier by Resputtering Technology

2009 ◽  
Vol 9 (2) ◽  
pp. 759-763
Author(s):  
Jung-Chih Tsao ◽  
Chuan-Pu Liu ◽  
Ying-Lang Wang ◽  
Kei-Wei Chen
Keyword(s):  
Diffusion Barrier ◽  
Diffusion Profile ◽  
Nitrogen Diffusion ◽  
Low Resistivity

Poultry Manure as a Fertilizer

EDIS ◽  
2013 ◽  
Vol 2013 (11) ◽  
Author(s):  
Michael A. Davis ◽  
Doug R. Sloan ◽  
Gerald Kidder ◽  
R. D. Jacobs
Keyword(s):  
Organic Matter ◽  
Environmental Factors ◽  
Nitrogen Content ◽  
Soil Amendment ◽  
Poultry Manure ◽  
Nutrient Retention ◽  
High Nitrogen Content ◽  
High Nitrogen ◽  
Animal Science ◽  
Fact Sheet

Animal manures have been used as natural crop fertilizers for centuries. Because of poultry manure’s high nitrogen content, it has long been recognized as one of the most desirable manures. Besides fertilizing crops, manures also supply other essential plant nutrients and serve as a soil amendment by adding organic matter, which helps improve the soil’s moisture and nutrient retention. Organic matter persistence will vary with temperature, drainage, rainfall, and other environmental factors. This 2-page fact sheet was written by Michael A. Davis, D.R. Sloan, Gerald Kidder, and R.D. Jacobs, and published by the UF Department of Animal Science, November 2013. http://edis.ifas.ufl.edu/aa205

Effect of a Ti-capped and Ti-mediated Layer on Co Silicide Formation

2002 ◽  
Vol 716 ◽  
Author(s):  
G.Z. Pan ◽  
E.W. Chang ◽  
Y. Rahmat-Samii
Keyword(s):  
Electron Diffraction ◽  
Sheet Resistance ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Diffusion Barrier ◽  
Silicide Formation ◽  
Plan View ◽  
Processing Window

AbstractWe comparatively studied the formation of ultra thin Co silicides, Co2Si, CoSi and CoSi2, with/without a Ti-capped and Ti-mediated layer by using rapid thermal annealing in a N2 ambient. Four-point-probe sheet resistance measurements and plan-view electron diffraction were used to characterize the silicides as well as the epitaxial characteristics of CoSi2 with Si. We found that the formation of the Co silicides and their existing duration are strongly influenced by the presence of a Ti-capped and Ti-mediated layer. A Ti-capped layer promotes significantly CoSi formation but suppresses Co2Si, and delays CoSi2, which advantageously increases the silicidation-processing window. A Ti-mediated layer acting as a diffusion barrier to the supply of Co suppresses the formation of both Co2Si and CoSi but energetically favors directly forming CoSi2. Plan-view electron diffraction studies indicated that both a Ti-capped and Ti-mediated layer could be used to form ultra thin epitaxial CoSi2 silicide.

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