Pt/SrBi2Ta2O9/Hf-Al-O/Si Field-Effect-Transistor with Long Retention Using Unsaturated Ferroelectric Polarization Switching

2004 ◽  
Vol 43 (11B) ◽  
pp. 7876-7878 ◽  
Author(s):  
Shigeki Sakai ◽  
Rajangam Ilangovan ◽  
Mitsue Takahashi
2020 ◽  
Vol 7 (14) ◽  
pp. 2000601
Author(s):  
Xiaoyan Li ◽  
Qiuxiang Zhu ◽  
Lorenzo Vistoli ◽  
Agnès Barthélémy ◽  
Manuel Bibes ◽  
...  

2007 ◽  
Vol 997 ◽  
Author(s):  
Sang-Hyun Lim ◽  
Alok C Rastogi ◽  
Seshu B Desu

AbstractMetal-Ferroelectric-Oxide-Si (MFEOS) field effect transistor (FET) with ferroelectric polyvinylidene fluoride trifluoroethylene copolymer (PVDF-TrFE) gate for nonvolatile memory application is demonstrated. Memory window ascribed to ferroelectric polarization switching has been quantified by shift of threshold voltage are ~ 4-5V. Non saturating IDS is due to free ionic polarization field. IDS-VDS characteristics of functional FET are realized after AC poling.


2010 ◽  
Vol E93-C (5) ◽  
pp. 540-545 ◽  
Author(s):  
Dong Seup LEE ◽  
Hong-Seon YANG ◽  
Kwon-Chil KANG ◽  
Joung-Eob LEE ◽  
Jung Han LEE ◽  
...  

2014 ◽  
Vol E97.C (7) ◽  
pp. 677-682
Author(s):  
Sung YUN WOO ◽  
Young JUN YOON ◽  
Jae HWA SEO ◽  
Gwan MIN YOO ◽  
Seongjae CHO ◽  
...  

2019 ◽  
Vol 24 (4) ◽  
pp. 407-414
Author(s):  
Oksana V. Gubanova ◽  
◽  
Evgeniy V. Kuznetsov ◽  
Elena N. Rybachek ◽  
Alexander N. Saurov ◽  
...  

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