Imaging in an Optical Projection System with a Light Source Composed of Point Sources

1995 ◽  
Vol 34 (Part 1, No. 1) ◽  
pp. 161-168
Author(s):  
Kiichi Takamoto
Keyword(s):  
Light Source ◽  
Point Sources ◽  
Projection System ◽  
Optical Projection

Three Dimensional X-Ray Image Synthesis

1972 ◽  
Vol 16 ◽  
pp. 336-343
Author(s):  
David G. Grant
Keyword(s):  
Three Dimensional ◽  
Image Synthesis ◽  
Dimensional Structure ◽  
Cross Sectional ◽  
Projection System ◽  
X Ray ◽  
Optical Projection ◽  
Planar Images ◽  
Scan Length ◽  
Simple Filter

AbstractTomographic systems are able to produce cross sectional planar images of three dimensional volumes because of the relative motion of the source, film and the volume under examination. Analysis shows that the image produced is a result of a three dimensional linear filtering process where the filter characteristics are determined by the scan geometry (3). If, instead of integrating continuously on a single film, a set of N radiographs are recorded, each corresponding to a point along the scan trajectory, then a simple filter can be defined to reconstruct the entire three dimensional structure from this data. In this case, the transfer function exhibits repetitive peaks whose spacing is determined by N and whose width is determined by the total scan length. The number of views required to produce the same “blurring” as the continuous case can then be determined by the Nyquist criteria(3).An optical projection system based on circular geometry for producing three dimensional medical images has been fabricated and tested. The technique can be generalized to any geometry and to all x-ray applications where plane-by-plane examination of a structure would prove beneficial.

Comparison of Measured and Modeled Lithographic Process Capabilities for 2.5D and 3D Applications Using a Step and Repeat Camera

2014 ◽  
Vol 2014 (1) ◽  
pp. 000178-000183 ◽  
Author(s):  
James Webb ◽  
Roger McCleary ◽  
Gerald Lopez ◽  
Qing Tan
Keyword(s):  
Image Features ◽  
Large Field ◽  
Light Spectrum ◽  
Single Exposure ◽  
Projection System ◽  
Critical Dimensions ◽  
Optical Projection ◽  
Extensive Evaluation ◽  
Advanced Packaging ◽  
3D Applications

Increasing volume using larger substrates with decreasing process margins create new challenges for advanced packaging applications. Key step and repeat camera technology continues being introduced for the mass production of high density interconnects used for 2.5D and 3D technologies that will provide solutions for the challenges encountered. A 2X reduction stepper with unique features achieves the tighter specifications needed for many advanced packaging applications printed on large substrates. A large field-of-view optical projection system utilizes the 350–450nm light spectrum from a mercury arc to expose the circuit patterns from a reticle mask onto a substrate and image features with the optimal fidelity required for advanced packaging technologies. The imaging field prints a large 52mm x 66mm area or 59.4mm x 59.4mm in a single exposure. These features enable a system to process larger substrates in fewer shots which result in higher throughput using lower power. Details of the camera and the adjustments that are provided to extend the range of use for both high power and high fidelity applications are discussed. An extensive evaluation of measured and modeled lithographic capabilities of the step and repeat camera to achieve critical dimensions with precise image placement is provided. Limiting resolution and depth of focus results sampled over the imaging field will be provided and supported with simulation. Results of thin and thick resist patterning will be presented and compared to simulated 3D resist profiles using the MACK4 model.

Optical Projection System Design for Photoresist Exposure

1969 ◽  
Vol 8 (1) ◽  
pp. 75 ◽  
Author(s):  
Milton D. Rosenau ◽  
Robert A. Jones ◽  
Leon Contente
Keyword(s):  
System Design ◽  
Projection System ◽  
Optical Projection

scholarly journals Application of Dimming Compensation Technology Via Liquid Crystal Lens for Non-Imaging Projection Laser Systems

Crystals ◽  
2019 ◽  
Vol 9 (3) ◽  
pp. 122
Author(s):  
Yi-Chin Fang ◽  
Cheng Tsai ◽  
Da-Long Cheng
Keyword(s):  
Liquid Crystal ◽  
Light Source ◽  
Optical Design ◽  
Good Control ◽  
Laser Source ◽  
Projection System ◽  
Lens Array ◽  
Local Dimming ◽  
Optical Paths ◽  
Liquid Crystal Lens

The main purpose of this paper is to explore a newly developed optical design, then to further improve the overhead lighting contrast in the laser projector module. In terms of the structural design of the projector, a liquid crystal lens array was used as the local dimming system for the light source, in order to achieve the objective, which was to significantly improve the contrast facility of the projection system. Second, in terms of the design of the light source, the output method for the light source was a laser light source employing arrays of micro-scanning. The main purpose was to compensate for the dim spots in the hole between the lenses in each unit of the liquid crystal when the liquid crystal lens array was locally dimmed, and thus significantly improving the contrast facility of the projection system. In terms of the software simulation, a liquid crystal lens array was used to simulate a pore size of 2.0 mm and focal lengths of 9 cm and 23 cm. The end effect gave good control and adjustment of the bright and dark areas during local dimming of the projector’s imaging chip components. For a single laser source, the maximum contrast for local dimming was about 128:1, 438:1, and 244:1, for the Red (R), Green (G), and Blue (B) optical paths, respectively. The light efficiency scores were approximately 20.91%, 20.05%, and 24.45%, for the R, G, and B optical paths, respectively. After compensation using a micro-scanning light source, the defect of having dim spots between the pores was remedied, and the light adjustment area became more uniform while the contrasts became smaller. The maximum contrasts were approximately 52:1, 122:1, and 110:1, for the R, G, and B optical paths, respectively. For the projector, when the liquid crystal lenses were not transmissive, the maximum uniformity scores were 82.25%, 87.15%, and 88.43%, for the R, G, and B optical paths, respectively.

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