Low Temperature Silicon Surface Cleaning by HF Etching/Ultraviolet Ozone Cleaning (HF/UVOC) Method (II)–in situUVOC

1989 ◽  
Vol 28 (Part 1, No. 12) ◽  
pp. 2425-2429 ◽  
Author(s):  
Tetsuya Kaneko ◽  
Maki Suemitsu ◽  
Nobuo Miyamoto
Keyword(s):  
Low Temperature ◽  
Silicon Surface ◽  
Surface Cleaning

Silicon Surface Cleaning for Low Temperature Epitaxial Growth

1993 ◽  
Vol 315 ◽  
Author(s):  
John O. Borland ◽  
Carol Riggi ◽  
Faye Brocious
Keyword(s):  
Low Temperature ◽  
Epitaxial Growth ◽  
Silicon Surface ◽  
Surface Cleaning

Silicon surface cleaning by low dose argon‐ion bombardment for low‐temperature (750 °C) epitaxial deposition. II. Epitaxial quality

1987 ◽  
Vol 62 (8) ◽  
pp. 3398-3404 ◽  
Author(s):  
L. M. Garverick ◽  
J. H. Comfort ◽  
T. R. Yew ◽  
R. Reif ◽  
F. A. Baiocchi ◽  
...  
Keyword(s):  
Low Temperature ◽  
Silicon Surface ◽  
Low Dose ◽  
Ion Bombardment ◽  
Surface Cleaning ◽  
Epitaxial Deposition ◽  
Argon Ion Bombardment ◽  
Argon Ion

Silicon Surface Cleaning for Low Temperature Silicon Epitaxial Growth

1998 ◽  
Vol 65-66 ◽  
pp. 229-232 ◽  
Author(s):  
Masao Mayuzumi ◽  
M. Imai ◽  
S. Nakahara ◽  
Katsuya Inoue ◽  
J. Takahashi ◽  
...  
Keyword(s):  
Low Temperature ◽  
Epitaxial Growth ◽  
Silicon Surface ◽  
Surface Cleaning
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