Influence of Reactive Gas Pressure on the Properties of Thin Film Ta2O5

1987 ◽  
Vol 26 (Part 1, No. 3) ◽  
pp. 347-351 ◽  
Author(s):  
Utis Teravaninthorn ◽  
Yuji Miyahara ◽  
Toyosaka Moriizumi
Keyword(s):  
Thin Film ◽  
Gas Pressure ◽  
Reactive Gas

Tuning of magnetization dynamics in sputtered CoFeB thin film by gas pressure

2012 ◽  
Vol 111 (7) ◽  
pp. 07A304 ◽  
Author(s):  
Feng Xu ◽  
Qijun Huang ◽  
Zhiqin Liao ◽  
Shandong Li ◽  
C. K. Ong
Keyword(s):  
Thin Film ◽  
Gas Pressure ◽  
Magnetization Dynamics

Thermal Conductivity of ZIF-8 Thin-Film under Ambient Gas Pressure

2017 ◽  
Vol 9 (34) ◽  
pp. 28139-28143 ◽  
Author(s):  
Boya Cui ◽  
Cornelius O. Audu ◽  
Yijun Liao ◽  
SonBinh T. Nguyen ◽  
Omar K. Farha ◽  
...  
Keyword(s):  
Thin Film ◽  
Thermal Conductivity ◽  
Gas Pressure ◽  
Ambient Gas

Influence of sputtering gas pressure on the LiCoO2 thin film cathode post-annealed at 400 °C

2006 ◽  
Vol 23 (5) ◽  
pp. 832-837 ◽  
Author(s):  
Ho Young Park ◽  
Sang Cheol Nam ◽  
Young Chang Lim ◽  
Kyu Gil Choi ◽  
Ki Chang Lee ◽  
...  
Keyword(s):  
Thin Film ◽  
Gas Pressure

Optical band engineering of metal-oxynitride based on tantalum oxide thin film fabricated via reactive gas-timing RF magnetron sputtering

2016 ◽  
Vol 306 ◽  
pp. 346-350 ◽  
Author(s):  
N. Khemasiri ◽  
S. Jessadaluk ◽  
C. Chananonnawathorn ◽  
S. Vuttivong ◽  
T. Lertvanithphol ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Tantalum Oxide ◽  
Rf Magnetron Sputtering ◽  
Oxide Thin Film ◽  
Band Engineering ◽  
Reactive Gas

scholarly journals Specific Features of Reactive Pulsed Laser Deposition of Solid Lubricating Nanocomposite Mo–S–C–H Thin-Film Coatings

Nanomaterials ◽  
2020 ◽  
Vol 10 (12) ◽  
pp. 2456
Author(s):  
Vyacheslav Fominski ◽  
Dmitry Fominski ◽  
Roman Romanov ◽  
Mariya Gritskevich ◽  
Maxim Demin ◽  
...  
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Tribological Properties ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Nanocomposite Coatings ◽  
Film Coatings ◽  
Thin Film Coatings ◽  
Chemical States ◽  
Reactive Gas

This work investigates the structure and chemical states of thin-film coatings obtained by pulsed laser codeposition of Mo and C in a reactive gas (H2S). The coatings were analysed for their prospective use as solid lubricating coatings for friction units operating in extreme conditions. Pulsed laser ablation of molybdenum and graphite targets was accompanied by the effective interaction of the deposited Mo and C layers with the reactive gas and the chemical states of Mo- and C-containing nanophases were interdependent. This had a negative effect on the tribological properties of Mo–S–C–H nanocomposite coatings obtained at H2S pressures of 9 and 18 Pa, which were optimal for obtaining MoS2 and MoS3 coatings, respectively. The best tribological properties were found for the Mo–S–C–H_5.5 coating formed at an H2S pressure of 5.5 Pa. At this pressure, the x = S/Mo ratio in the MoSx nanophase was slightly less than 2, and the a-C(S,H) nanophase contained ~8 at.% S and ~16 at.% H. The a-C(S,H) nanophase with this composition provided a low coefficient of friction (~0.03) at low ambient humidity and 22 °C. The nanophase composition in Mo–S–C–H_5.5 coating demonstrated fairly good antifriction properties and increased wear resistance even at −100 °C. For wet friction conditions, Mo–S–C–H nanocomposite coatings did not have significant advantages in reducing friction compared to the MoS2 and MoS3 coatings formed by reactive pulsed laser deposition.

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