Characteristics of Hydrogenated Amorphous Silicon Films Prepared by Electron Cyclotron Resonance Microwave Plasma Chemical Vapor Deposition Method and Their Application to Photodiodes

Kazuhiro Kobayashi; Masahiro Hayama; Satoru Kawamoto; Hidejiro Miki

doi:10.1143/jjap.26.202

Characteristics of Hydrogenated Amorphous Silicon Films Prepared by Electron Cyclotron Resonance Microwave Plasma Chemical Vapor Deposition Method and Their Application to Photodiodes

Japanese Journal of Applied Physics ◽

10.1143/jjap.26.202 ◽

1987 ◽

Vol 26 (Part 1, No. 2) ◽

pp. 202-208 ◽

Cited By ~ 31

Author(s):

Kazuhiro Kobayashi ◽

Masahiro Hayama ◽

Satoru Kawamoto ◽

Hidejiro Miki

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous ◽

Resonance Microwave

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Deposition and properties of a-C:H films on polymethyl methacrylate by electron cyclotron resonance microwave plasma chemical vapor deposition method

Surface and Coatings Technology ◽

10.1016/s0257-8972(99)00479-x ◽

2000 ◽

Vol 123 (2-3) ◽

pp. 273-277 ◽

Cited By ~ 22

Author(s):

X.T. Zhou ◽

S.T. Lee ◽

I. Bello ◽

A.C. Cheung ◽

D.S. Chiu ◽

...

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Microwave

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Mechanical properties of amorphous carbon nitride films synthesized by electron cyclotron resonance microwave plasma chemical vapor deposition

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(99)00443-3 ◽

1999 ◽

Vol 254 (1-3) ◽

pp. 180-185 ◽

Cited By ~ 15

Author(s):

Wai-Chung Chan ◽

Man-Keung Fung ◽

Kai-Ho Lai ◽

Igor Bello ◽

Shuit-Tong Lee ◽

...

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Amorphous Carbon Nitride ◽

Resonance Microwave

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Physical properties of a-C:H films prepared by electron cyclotron resonance microwave plasma chemical vapor deposition

Materials Science and Engineering B ◽

10.1016/s0921-5107(00)00487-6 ◽

2000 ◽

Vol 77 (3) ◽

pp. 229-234 ◽

Cited By ~ 11

Author(s):

X.T. Zhou ◽

S.T. Lee ◽

I. Bello ◽

A.C. Cheung ◽

D.S. Chiu ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Physical Properties ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Microwave

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Low-pressure deposition of diamond by electron cyclotron resonance microwave plasma chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/s0022-0248(99)00791-5 ◽

2000 ◽

Vol 211 (1-4) ◽

pp. 216-219 ◽

Cited By ~ 8

Author(s):

M.J Chiang ◽

B.H Lung ◽

M.H Hon

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Microwave

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Characterization of hydrogenated amorphous boron films prepared by electron cyclotron resonance plasma chemical vapor deposition method

Journal of Applied Physics ◽

10.1063/1.345145 ◽

1990 ◽

Vol 67 (10) ◽

pp. 6286-6291 ◽

Cited By ~ 32

Author(s):

Koun Shirai ◽

Shun‐ichi Gonda

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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Ion bombardment effects on undoped hydrogenated amorphous silicon films deposited by the electron cyclotron resonance plasma chemical vapor deposition method

Journal of Applied Physics ◽

10.1063/1.345690 ◽

1990 ◽

Vol 67 (3) ◽

pp. 1356-1360 ◽

Cited By ~ 10

Author(s):

Masahiro Hayama ◽

Hiroyuki Murai ◽

Kazuhiro Kobayashi

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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Fracture resistance enhancement of diamond-like carbon/nitrogenated diamond-like carbon multilayer deposited by electron cyclotron resonance microwave plasma chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1326941 ◽

2001 ◽

Vol 19 (1) ◽

pp. 130-135 ◽

Cited By ~ 9

Author(s):

J. Qi ◽

K. H. Lai ◽

I. Bello ◽

C. S. Lee ◽

S. T. Lee ◽

...

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Fracture Resistance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Microwave

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Nitrogen plasma instabilities and the growth of silicon nitride by electron cyclotron resonance microwave plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.363943 ◽

1997 ◽

Vol 81 (6) ◽

pp. 2839-2846 ◽

Cited By ~ 19

Author(s):

F. S. Pool

Keyword(s):

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Chemical Vapor ◽

Nitrogen Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Microwave

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Mechanical properties of DLC films prepared in acetylene and methane plasmas using electron cyclotron resonance microwave plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/s0925-9635(01)00460-5 ◽

2001 ◽

Vol 10 (9-10) ◽

pp. 1862-1867 ◽

Cited By ~ 30

Author(s):

K.H. Lai ◽

C.Y. Chan ◽

M.K. Fung ◽

I. Bello ◽

C.S. Lee ◽

...

Keyword(s):

Mechanical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Microwave

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Homoepitaxial growth of diamond thin films by electron cyclotron‐resonance microwave plasma chemical‐vapor‐deposition apparatus with CO/H2gaseous source

Applied Physics Letters ◽

10.1063/1.108862 ◽

1993 ◽

Vol 62 (6) ◽

pp. 582-584 ◽

Cited By ~ 10

Author(s):

Masaaki Komori ◽

Tetsuro Maki ◽

Taigen Kim ◽

Gen Liang Hou ◽

Yoshiyuki Sakaguchi ◽

...

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Homoepitaxial Growth ◽

Resonance Microwave

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