Photolysis of aqueous free chlorine species (HOCl and OCl–) with 254 nm ultraviolet light

2007 ◽  
Vol 6 (3) ◽  
pp. 277-284 ◽  
Author(s):  
Yangang Feng ◽  
Daniel W Smith ◽  
James R Bolton
Keyword(s):  
Ultraviolet Light ◽  
Free Chlorine

Corrigendum: Photolysis of aqueous free chlorine species (HOCl and OCl–) with 254 nm ultraviolet light

2010 ◽  
Vol 37 (1) ◽  
pp. 179-180
Author(s):  
Yangang Feng ◽  
Daniel W. Smith ◽  
James R. Bolton
Keyword(s):  
Ultraviolet Light ◽  
Free Chlorine

The Use of Styrenes as Embedding Media for Electron Microscopy

1971 ◽  
Vol 29 ◽  
pp. 488-489
Author(s):  
Edward D. De-Lamater ◽  
Eric Johnson ◽  
Thad Schoen ◽  
Cecil Whitaker
Keyword(s):  
Electron Microscopy ◽  
Surface Tension ◽  
Ultraviolet Light ◽  
Methyl Ethyl Ketone Peroxide ◽  
Methyl Ethyl ◽  
Styrene Polymerization ◽  
Radical Initiation ◽  
Tertiary Butyl ◽  
Low Viscosity ◽  
Free Radical Initiation

Monomeric styrenes are demonstrated as excellent embedding media for electron microscopy. Monomeric styrene has extremely low viscosity and low surface tension (less than 1) affording extremely rapid penetration into the specimen. Spurr's Medium based on ERL-4206 (J.Ultra. Research 26, 31-43, 1969) is viscous, requiring gradual infiltration with increasing concentrations. Styrenes are soluble in alcohol and acetone thus fitting well into the usual dehydration procedures. Infiltration with styrene may be done directly following complete dehydration without dilution.Monomeric styrenes are usually inhibited from polymerization by a catechol, in this case, tertiary butyl catechol. Styrene polymerization is activated by Methyl Ethyl Ketone peroxide, a liquid, and probably acts by overcoming the inhibition of the catechol, acting as a source of free radical initiation.Polymerization is carried out either by a temperature of 60°C. or under ultraviolet light with wave lengths of 3400-4000 Engstroms; polymerization stops on removal from the ultraviolet light or heat and is therefore controlled by the length of exposure.

Resolution in photoelectron microscopy

1991 ◽  
Vol 49 ◽  
pp. 458-459
Author(s):  
G. F. Rempfer
Keyword(s):  
Electron Microscopy ◽  
Electric Field ◽  
Ultraviolet Light ◽  
Uniform Field ◽  
Virtual Image ◽  
Lens System ◽  
Photoemission Electron Microscopy ◽  
Planar Electrode ◽  
Electron Lens ◽  
Photoemission Electron

In photoelectron microscopy (PEM), also called photoemission electron microscopy (PEEM), the image is formed by electrons which have been liberated from the specimen by ultraviolet light. The electrons are accelerated by an electric field before being imaged by an electron lens system. The specimen is supported on a planar electrode (or the electrode itself may be the specimen), and the accelerating field is applied between the specimen, which serves as the cathode, and an anode. The accelerating field is essentially uniform except for microfields near the surface of the specimen and a diverging field near the anode aperture. The uniform field forms a virtual image of the specimen (virtual specimen) at unit lateral magnification, approximately twice as far from the anode as is the specimen. The diverging field at the anode aperture in turn forms a virtual image of the virtual specimen at magnification 2/3, at a distance from the anode of 4/3 the specimen distance. This demagnified virtual image is the object for the objective stage of the lens system.

Ultrastructural Changes in Three Different Mammalian Cells Following Ultraviolet Laser Irradiation

1972 ◽  
Vol 30 ◽  
pp. 350-351
Author(s):  
K. Shankar Narayan ◽  
Kailash C. Gupta ◽  
Tohru Okigaki
Keyword(s):  
Ultraviolet Light ◽  
Mammalian Cells ◽  
Biological Effects ◽  
Survival Rates ◽  
Chinese Hamster ◽  
Cell Types ◽  
Differential Sensitivity ◽  
Ultrastructural Changes ◽  
Ultraviolet Laser

The biological effects of short-wave ultraviolet light has generally been described in terms of changes in cell growth or survival rates and production of chromosomal aberrations. Ultrastructural changes following exposure of cells to ultraviolet light, particularly at 265 nm, have not been reported.We have developed a means of irradiating populations of cells grown in vitro to a monochromatic ultraviolet laser beam at a wavelength of 265 nm based on the method of Johnson. The cell types studies were: i) WI-38, a human diploid fibroblast; ii) CMP, a human adenocarcinoma cell line; and iii) Don C-II, a Chinese hamster fibroblast cell strain. The cells were exposed either in situ or in suspension to the ultraviolet laser (UVL) beam. Irradiated cell populations were studied either "immediately" or following growth for 1-8 days after irradiation.Differential sensitivity, as measured by survival rates were observed in the three cell types studied. Pattern of ultrastructural changes were also different in the three cell types.

A folding ultraviolet light box

1973 ◽  
Vol 107 (5) ◽  
pp. 716-716 ◽  
Author(s):  
V. H. Witten
Keyword(s):  
Ultraviolet Light
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