a-Si:N:H prepared by reactive evaporation in ammonia vapour
Keyword(s):
The reactive evaporation of Si in an ammonia ambient has been used to produce a-Si:N:H thin films. These films are "intrinsic-like" with low room-temperature conductivities (<10−12 S∙cm−1), high activation energies (0.9 eV), and high optical bandgaps (1.9 eV). Films prepared in this manner have been doped using co-evaporation of antimony (n type) and indium (p type). The addition of 2 at.% indium or antimony results in an increase in the room-temperature conductivity by eight and six orders of magnitude respectively. The undoped and doped samples are photoconductive when illuminated with a quartz-halogen source.
2016 ◽
Vol 113
(46)
◽
pp. 12929-12933
◽
2011 ◽
Vol 418-420
◽
pp. 684-687
◽
2007 ◽
Vol 22
(5)
◽
pp. 1390-1395
◽
2019 ◽
Vol 14
(29)
◽
pp. 37-43
◽