New semiconductor materials and structures for electro-optical devices

1985 ◽  
Vol 63 (6) ◽  
pp. 801-810
Author(s):  
B. K. Garside ◽  
P. E. Jessop

New semiconductor materials and device structures are essential to the development of new types of electro-optical devices and systems in areas such as integrated optics, optical communications, and optical computing. This paper presents a discussion of basic materials requirements, in terms of both optical properties and materials fabrication technologies, for representative electro-optical devices. In the area of optical communications, interest is shifting towards longer wavelengths, which generates the need for sources and detectors operating in the same region. The current status and future possibilities for such devices, as examplified by fast photodetectors, are discussed in terms of new semiconductor alloy materials and device structures. In the areas of optical computing and integrated optics, the basic essential structure is a low-loss optical thin-film waveguide. The materials aspects of such devices are discussed, and the relevant considerations are illustrated through a description of recent work with GeO2 waveguides.

2008 ◽  
Author(s):  
Haisheng Rong ◽  
Simon Ayotte ◽  
Shengbo Xu ◽  
Oded Cohen ◽  
Mario Paniccia

1986 ◽  
Vol 90 ◽  
Author(s):  
Tse Tung ◽  
M. H. Kalisher ◽  
A. P. Stevens ◽  
P. E. Herning

ABSTRACTOver the past few years, liquid-phase epitaxy (LPE) has become an established growth technique for the synthesis of HgCdTe. This paper reviews one of the most successful LPE technologies developed for HgCdTe, specifically, “infinite-melt” vertical LPE (VLPE) from Hg-rich solutions.Despite the very high Hg vapor pressure (> 10 atm) and the extremely low solubility of Cd in the Hg solution (< 10−3 mol%), this approach was believed to offer the best long-term prospect for growth of HgCdTe suitable for various device structures. Since the initial demonstration of LPE growth of HgCdTe layers from Hg solution in experiments conducted at SBRC in 1978, the VLPE technology has advanced to the point where epitaxial HgCdTe can now be grown for photoconductive (PC) and photovoltaic (PV) as well as monolithic metal-insulator-semiconductor (MIS) and high-frequency laser-detector devices with state-of-the-art performance in the entire 2–12 μm spectral region.A historical perspective and the current status of VLPE technology are reported. Particular emphasis is placed on the important role of the ther-modynamic parameters (phase diagram) and on control of stoichiometry (defect chemistry) and impurity doping (distribution coefficient) for growth of HgCdTe layers from Hg solution. Critical material characteristics, such as transport properties, minority-carrier lifetime, morphology and crystal structure, are also discussed. Finally, a comparison with the LPE technol-ogy using Te solutions, which has been the mainstay of the remainder of the IR community, is presented.


2017 ◽  
Vol 53 (5) ◽  
pp. 1-7 ◽  
Author(s):  
Kim Peng Lim ◽  
Vivek Krishnamurthy ◽  
Ji Feng Ying ◽  
Jing Pu ◽  
Qian Wang
Keyword(s):  

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